IP Library Granted Patent US 9,123,879
Granted Patent B2
US 9,123,879 · App. 14/202,802 · Granted Sep 1, 2015

Magnetoresistive element and method of manufacturing the same

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Quick Facts
Patent No.
US 9,123,879
App. No.
14/202,802
Granted
Sep 1, 2015
Kind
B2
Abstract

According to one embodiment, a magnetoresistive element is disclosed. The magnetoresistive element includes a reference layer, a tunnel barrier layer, a storage layer. The storage layer includes a first region and a second region provided outside the first region to surround the first region, the second region including element included in the first region and another element being different from the element. The magnetoresistive element further includes a cap layer including a third region and a fourth region provided outside the third region to surround the third region, the fourth region including an element included in the third region and the another element.

Claims (11)

1. A magnetoresistive element comprising:

a reference layer;

a tunnel barrier layer;

a storage layer comprising a first region and a second region provided outside the first region to surround the first region, the second region including element included in the first region and another element being different from the element; and

a cap layer comprising a third region and a fourth region provided outside the third region to surround the third region, the fourth region including an element included in the third region and the another element.

2. The magnetoresistive element according to claim 1 , wherein the another element included in the second region is larger in amount than the another element included in the first region.

3. The magnetoresistive element according to claim 1 , wherein the tunnel barrier layer is provided on the reference layer, the storage layer is provided on the tunnel barrier layer, and the cap layer is provided on the storage layer.

4. The magnetoresistive element according to claim 1 , wherein the tunnel barrier layer is provided on the storage layer, the reference layer is provided on the tunnel barrier layer, and the cap layer is provide on the reference layer.

5. The magnetoresistive element according to claim 4 , wherein widths of the storage layer and the tunnel barrier layer are greater than a width of the reference layer.

6. The magnetoresistive element according to claim 1 , wherein the reference layer comprises a fifth region and a sixth region provided outside the fifth region to surround the fifth region, and the sixth region includes element included in the fifth region and the another element.

7. The magnetoresistive element according to claim 1 , wherein the another element is at least one of As, Ge, Ga, Sb, In, N, Ar, He, F, Cl, Br, I, O, Si, B, C, Zr, Tb, S, Se, P and Ti.

Assignments (6)
CHANGE OF NAME Recorded Feb 15, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 059110/0850 →
CHANGE OF NAME Recorded Jan 20, 2022
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058711/0088 →
MERGER AND CHANGE OF NAME Recorded Jan 20, 2022
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: K.K. PANGEA
Reel/Frame 058786/0085 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 12, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION; SK HYNIX, INC.
Reel/Frame 043559/0459 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ADDRESS OF THE SECOND ASSIGNEE PREVIOUSLY RECORDED AT REEL: 037924 FRAME: 0705. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Mar 21, 2016
From: NAKAYAMA, MASAHIKO; YOSHIKAWA, MASATOSHI; KAI, TADASHI; HASHIMOTO, YUTAKA; TOKO, MASARU; YODA, HIROAKI; OH, JAE GEUN; LEE, KEUM BUM; RYU, CHOON KUN; LEE, HYUNG SUK; KIM, SOOK JOO
To: KABUSHIKI KAISHA TOSHIBA; SK HYNIX INC.
Reel/Frame 038188/0382 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 8, 2016
From: NAKAYAMA, MASAHIKO; YOSHIKAWA, MASATOSHI; KAI, TADASHI; HASHIMOTO, YUTAKA; TOKO, MASARU; YODA, HIROAKI; OH, JAE GEUN; LEE, KEUM BUM; RYU, CHOON KUN; LEE, HYUNG SUK; KIM, SOOK JOO
To: KABUSHIKI KAISHA TOSHIBA; SK HYNIX INC.
Reel/Frame 037924/0705 →