Magnetic memory and manufacturing method thereof

1. A magnetic memory comprising:

a cell transistor on a semiconductor substrate, the cell transistor including a first source/drain diffusion layer, a second source/drain diffusion layer, a first gate insulation film on a channel region between the first source/drain diffusion layer and the second source/drain diffusion layer, and a first gate electrode on the first gate insulation film;

a first contact on the first source/drain diffusion layer of the cell transistor;

a magnetoresistive effect element as a memory element, on the first contact;

a second contact on the second source/drain diffusion layer of the cell transistor, the second contact including a first plug on the second source/drain diffusion layer, and a second plug on the first plug, the second plug neighboring the memory element;

a first bit line above the magnetoresistive effect element as the memory element; and

a second bit line above the second contact;

wherein the first contact includes a first titanium nitride film on the first source/drain diffusion layer, and a first tantalum film on the first titanium nitride film; and

wherein the first plug includes a first tungsten film buried in an interlayer insulation film on the semiconductor substrate, and a second titanium nitride film between the interlayer insulation film and the first tungsten film.

2. The magnetic memory according to claim 1 , wherein the magnetoresistive effect element includes a side wall insulation film on a side surface of the magnetoresistive effect element.

3. The magnetic memory according to claim 1 , wherein an upper surface of the first plug is located more on the semiconductor substrate side than an upper surface of the first contact.

4. The magnetic memory according to claim 1 , wherein a maximum dimension of the second plug in a direction parallel to a surface of the semiconductor substrate is less than a maximum dimension of the first plug in the direction parallel to the surface of the semiconductor substrate.

5. The magnetic memory according to claim 1 , wherein an aspect ratio of the second plug is less than an aspect ratio of the first plug.

6. The magnetic memory according to claim 1 , wherein a material of the first plug is the same as a material of the first contact.

7. The magnetic memory according to claim 1 , wherein a material of the first plug is different from a material of the first contact.

8. The magnetic memory according to claim 7 , further comprising:

a first transistor on the semiconductor substrate, the first transistor including a third source/drain diffusion layer, a fourth source/drain diffusion layer, a second gate insulation film on a channel region between the third source/drain diffusion layer and the fourth source/drain diffusion layer, and a second gate electrode on the second gate insulation film; and

a third contact on the second source/drain diffusion layer of the first transistor,

wherein a material of the third contact is different from the material of the first contact and is the same as the material of the first plug.

9. A manufacturing method of a magnetic memory, the method comprising:

forming a cell transistor on a semiconductor substrate, the cell transistor including a first source/drain diffusion layer, a second source/drain diffusion layer, a first gate insulation film on a channel region between the first source/drain diffusion layer and the second source/drain diffusion layer, and a first gate electrode on the first gate insulation film;

forming a first contact on the first source/drain diffusion layer, and forming a first plug on the second source/drain diffusion layer;

forming a magnetoresistive effect element as a memory element, on the first contact;

forming a second plug on the first plug to form a second contact including the first plug and the second plug; and

forming a first bit line above the magnetoresistive effect element, and forming a second bit line above the second plug;

wherein a material of the first plug is the same as a material of the first contact;

wherein the first contact includes a first titanium nitride film on the first source/drain diffusion layer, and a first tantalum film on the first titanium nitride film;

wherein the first plug includes a second titanium nitride film on the second source/drain diffusion layer, and a second tantalum film on the second titanium nitride film; and

wherein a film thickness of the second tantalum film is less than a film thickness of the first tantalum film.

10. The manufacturing method of the magnetic memory according to claim 9 , further comprising forming a side wall insulation film on a side surface of the magnetoresistive effect element, after forming the magnetoresistive effect element and before forming the second plug.

11. The manufacturing method of the magnetic memory according to claim 9 , wherein when the magnetoresistive effect element is formed, an upper surface of the first plug and an upper surface of a first interlayer insulation film in which the first contact and the first plug are buried are etched, and the upper surface of the first plug and the upper surface of the first interlayer insulation film retreat to the semiconductor substrate side.

12. The manufacturing method of the magnetic memory according to claim 9 , wherein the first contact and the first plug are formed at the same time.

13. The manufacturing method of the magnetic memory according to claim 9 , wherein the first contact and the first plug are formed at different timings.

14. The manufacturing method of the magnetic memory according to claim 9 , wherein a material of the first plug is different from a material of the first contact.

15. The manufacturing method of the magnetic memory according to claim 9 , further comprising:

forming a first transistor on the semiconductor substrate, the first transistor including a first source/drain diffusion layer, a second source/drain diffusion layer, a second gate insulation film on a channel region between the first source/drain diffusion layer and the second source/drain diffusion layer, and a second gate electrode on the second gate insulation film; and

forming a third contact on the third source/drain diffusion layer,

wherein a material of the third contact is different from a material of the first contact and is the same as a material of the first plug.