Substrate processing apparatus
In a substrate processing apparatus, an election head from a position above a substrate held by a substrate holding part to an inspection position above a standby pod disposed outside a cup part. At the inspection position, a processing liquid ejected from the ejection head toward the standby pod is irradiated with planar light emitted from a light emitting part. An imaging part acquires an inspection image including bright dots appearing on the processing liquid, and a determination part determines the quality of the ejection operation of the ejection head on the basis of the inspection image. Accordingly, it is possible to eliminate the influence of reflected light from the substrate and droplets, mist, or the like of the processing liquid having collided with the substrate and to accurately determine the quality of the ejection operation of the ejection head.
1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holding part for holding a substrate;
a cup part surrounding said substrate holding part;
an ejection head disposed above said substrate holding part inside said cup part and for ejecting a processing liquid toward said substrate;
a standby pod disposed outside said cup part and in which a lower end portion of said ejection head is housed when said ejection head is on standby;
a supply part movement mechanism for moving said ejection head from a position above said substrate holding part to an inspection position above said standby pod;
a light emitting part for emitting light along a predetermined light existing plane to irradiate said processing liquid that is ejected from said ejection head toward said standby pod with light when said projection liquid passes through said light existing plane, said ejection head being located at said inspection position;
an imaging part for capturing an image of said processing liquid passing through said light existing plane to acquire an inspection image that includes a bright dot appearing on said processing liquid; and
a determination part for determining quality of an ejection operation of said ejection head on the basis of said inspection image.
2. The substrate processing apparatus according to claim 1 , wherein
said light existing plane passes through a gap between a lower end of said ejection head located at said inspection position and an upper end of said standby pod.
3. The substrate processing apparatus according to claim 1 , further comprising:
an imaging-part cleaning part for cleaning a front surface of said imaging part in an imaging direction of said imaging part.
4. The substrate processing apparatus according to claim 1 , further comprising:
a light-emitting-part cleaning part for cleaning a front surface of said light emitting part in a light emitting direction of said light emitting part.
5. The substrate processing apparatus according to claim 1 , wherein
a projected imaging axis and a projected optical axis have a point of intersection, said projected imaging axis being obtained by projecting an imaging axis of said imaging part in an ejection direction in which said ejection head ejects a processing liquid, on a projection plane perpendicular to said ejection direction, and said projected optical axis being obtained by projecting an optical axis of said light emitting part in said ejection direction on said projection plane, and
an angle formed by a portion of the projected imaging axis between said point of intersection and said imaging part and a portion of said projected optical axis between said point of intersection and said light emitting part is greater than 90 degrees.
6. The substrate processing apparatus according to claim 1 , further comprising:
a light-tight chamber having an internal space in which said ejection head, said light emitting part, and said imaging part are housed, and for preventing entry of light into said internal space from outside.
7. The substrate processing apparatus according to claim 1 , wherein
said ejection head includes a plurality of outlets, each ejecting said processing liquid,
said light emitting part irradiates a plurality of flying droplets passing through said light existing plane with light, said plurality of flying droplets being said processing liquid ejected from said plurality of outlets,
said imaging part captures an image of said plurality of flying droplets passing through said light existing plane to acquire said inspection image that includes a plurality of bright dots appearing on said plurality of flying droplets, and
said determination part determines quality of an ejection operation of each of said plurality of outlets on the basis of said inspection image.
8. The substrate processing apparatus according to claim 7 , wherein
said light existing plane passes through a gap between a lower end of said ejection head located at said inspection position and an upper end of said standby pod.
9. The substrate processing apparatus according to claim 8 , further comprising:
an imaging-part cleaning part for cleaning a front surface of said imaging part in an imaging direction of said imaging part.
10. The substrate processing apparatus according to claim 9 , further comprising:
a light-emitting-part cleaning part for cleaning a front surface of said light emitting part in a light emitting direction of said light emitting part.
11. The substrate processing apparatus according to claim 10 , wherein
a projected imaging axis and a projected optical axis have a point of intersection, said projected imaging axis being obtained by projecting an imaging axis of said imaging part in an ejection direction in which said ejection head ejects a processing liquid, on a projection plane perpendicular to said ejection direction, and said projected optical axis being obtained by projecting an optical axis of said light emitting part in said ejection direction on said projection plane, and
an angle formed by a portion of the projected imaging axis between said point of intersection and said imaging part and a portion of said projected optical axis between said point of intersection and said light emitting part is greater than 90 degrees.
12. The substrate processing apparatus according to claim 11 , further comprising:
a light-tight chamber having an internal space in which said ejection head, said light emitting part, and said imaging part are housed, and for preventing entry of light into said internal space from outside.
13. The substrate processing apparatus according to claim 12 , further comprising:
a maintenance part for performing maintenance of said ejection head; and
a maintenance control part for, when said determination part detects a failure in the ejection operation of said ejection head, controlling said supply part movement mechanism and said maintenance part to move said ejection head down from said inspection position and perform maintenance of said ejection head with said lower end portion of said ejection head housed in said standby pod.
14. The substrate processing apparatus according to claim 13 , wherein
said maintenance part is a vibration part for vibrating an immersion liquid retained in said standby pod, and
when a failure in the ejection operation of said ejection head is detected, in said standby pod, said lower end portion of said ejection head is immersed in said immersion liquid retained in said standby pod and said vibration part vibrates said immersion liquid to clean said ejection head.
15. The substrate processing apparatus according to claim 7 , further comprising:
an imaging-part cleaning part for cleaning a front surface of said imaging part in an imaging direction of said imaging part.
16. The substrate processing apparatus according to claim 7 , further comprising:
a light-emitting-part cleaning part for cleaning a front surface of said light emitting part in a light emitting direction of said light emitting part.
17. The substrate processing apparatus according to claim 7 , wherein
a projected imaging axis and a projected optical axis have a point of intersection, said projected imaging axis being obtained by projecting an imaging axis of said imaging part in an ejection direction in which said ejection head ejects a processing liquid, on a projection plane perpendicular to said ejection direction, and said projected optical axis being obtained by projecting an optical axis of said light emitting part in said ejection direction on said projection plane, and
an angle formed by a portion of the projected imaging axis between said point of intersection and said imaging part and a portion of said projected optical axis between said point of intersection and said light emitting part is greater than 90 degrees.
18. The substrate processing apparatus according to claim 7 , further comprising:
a light-tight chamber having an internal space in which said ejection head, said light emitting part, and said imaging part are housed, and for preventing entry of light into said internal space from outside.
19. The substrate processing apparatus according to claim 1 , further comprising:
a maintenance part for performing maintenance of said ejection head; and
a maintenance control part for, when said determination part detects a failure in the ejection operation of said ejection head, controlling said supply part movement mechanism and said maintenance part to move said ejection head down from said inspection position and perform maintenance of said ejection head with said lower end portion of said ejection head housed in said standby pod.
20. The substrate processing apparatus according to claim 19 , wherein
said maintenance part is a vibration part for vibrating an immersion liquid retained in said standby pod, and
when a failure in the ejection operation of said ejection head is detected, in said standby pod, said lower end portion of said ejection head is immersed in said immersion liquid retained in said standby pod and said vibration part vibrates said immersion liquid to clean said ejection head.