Imaging device, imaging apparatus, production apparatus and method, and semiconductor device

1. An imaging device comprising:

a semiconductor having a light-receiving portion configured to perform photoelectric conversion of incident light;

electrically conductive wirings; and

a contact group including a plurality of contacts that have different sizes and connect the semiconductor and the electrically conductive wirings,

wherein,

ground contacts within the contact group have different sizes, the ground contacts connecting a pixel well region of the semiconductor and the electrically conductive wirings to a ground potential.

2. The imaging device according to claim 1 , wherein a size of at least one of the ground contacts in an optical black region of the semiconductor is different from a size of at least one of the ground contacts in an effective pixel region of the semiconductor.

3. The imaging device according to claim 2 , wherein the ground contacts in the optical black region have a first size, and the ground contacts in the effective pixel region have a second size that is different from the first size.

4. The imaging device according to claim 2 , wherein the ground contacts in the effective pixel region have a predetermined size, and the ground contacts in the optical black region have different sizes.

5. The imaging device according to claim 1 , wherein the ground contacts in an effective pixel region of the semiconductor have different sizes.

6. The imaging device according to claim 5 , wherein each of the ground contacts in the effective pixel region has a size in accordance with an image height.

7. The imaging device according to claim 5 , wherein sizes of the ground contacts in a part of the effective pixel region are different from sizes of the ground contacts in another part of the effective pixel region.

8. The imaging device according to claim 1 , wherein a size of a ground contact that connects a pixel well region of the semiconductor and a corresponding one of the electrically conductive wirings at a ground potential is different from a size of another contact excluding the ground contact, within the contact group.

9. The imaging device according to claim 8 , wherein the another contact includes at least one of

a power source contact that connects a circuit element formed in the semiconductor and a corresponding one of the electrically conductive wirings at a power source potential,

a floating diffusion contact that connects a floating diffusion formed in the semiconductor and a corresponding one of the electrically conductive wirings, and

a vertical signal line contact that connects a select transistor formed in the semiconductor and a corresponding one of the electrically conductive wirings.

10. The imaging device according to claim 8 , wherein only the ground contact has a predetermined size, and other contacts excluding the ground contact have a plurality of different sizes.

11. The imaging device according to claim 8 , wherein only the ground contacts have a plurality of different sizes, and other contacts excluding the ground contact have a predetermined size.

12. An imaging apparatus comprising:

an imaging device including (a) a semiconductor having a light-receiving portion configured to perform photoelectric conversion of incident light, (b) electrically conductive wirings, and (c) a contact group including a plurality of contacts that have different sizes and connect the semiconductor and the electrically conductive wirings; and

an image processing section that processes an image of a subject, the image having undergone the photoelectric conversion in the imaging device,

wherein,

the setting section sets a size of a ground contact that connects a pixel well region of the semiconductor and a corresponding one of the electrically conductive wirings to a ground potential.

13. A production apparatus configured to produce an imaging device, the production apparatus comprising:

a setting section configured to set different sizes of a plurality of contacts that connect a semiconductor and electrically conductive wirings;

a semiconductor element forming section configured to form elements in the semiconductor, the elements including a light-receiving portion configured to perform photoelectric conversion of incident light;

a contact forming section configured to form the contacts in accordance with setting of the setting section; and

an electrically conductive wiring forming configured to form the electrically conductive wirings,

wherein,

the setting section sets a size of a ground contact that connects a pixel well region of the semiconductor and a corresponding one of the electrically conductive wirings to a ground potential.

14. The production apparatus according to claim 13 , wherein the setting section sets sizes of the ground contacts in an effective pixel region and in an optical black region in accordance with a difference between a dark signal level in the effective pixel region and a dark signal level in the optical black region.

15. The production apparatus according to claim 13 , wherein the setting section sets sizes of the ground contacts in an effective pixel region in accordance with variations of dark signal levels due to positions of the ground contacts in the effective pixel region.

16. The production apparatus according to claim 13 , wherein the setting section sets a size of the ground contact of an abnormal pixel in accordance with a difference between a dark signal level of the abnormal pixel and a dark signal level of a normal pixel.

17. A production method performed by a production apparatus that produces an imaging device, the production method comprising:

setting different sizes for contacts that connect a semiconductor and electrically conductive wirings;

forming, in the semiconductor, an element including a light-receiving portion that performs photoelectric conversion of incident light;

forming the contacts in accordance with setting for sizes set for the contacts; and

forming the electrically conductive wirings,

wherein,

the setting section sets a size of a ground contact that connects a pixel well region of the semiconductor and a corresponding one of the electrically conductive wirings to a ground potential.

18. A semiconductor device comprising:

a semiconductor having a circuit element;

electrically conductive wirings; and

a contact group including contacts that have different sizes and connect the semiconductor and the electrically conductive wirings,

wherein,

the setting section sets a size of a ground contact that connects a pixel well region of the semiconductor and a corresponding one of the electrically conductive wirings to a ground potential.