OPTOELECTRIC DEVICE AND METHOD FOR MANUFACTURING THE SAME
A method for manufacturing an optoelectric device may include the steps of providing a layer of an optoelectric active material between a first electrode and a second electrode, providing a patterned electrically insulating layer structure at least one of said electrodes, the patterned electrically insulating layer structure having openings, providing an electrolyte in said openings, and depositing a metallic layer in said openings from the electrolyte by electroplating, wherein the electrolyte is formed by an ionic liquid.
1 . Optoelectric device comprising:
a layer of an optoelectric active material between a first electrode and a second electrode;
a patterned electrically insulating layer structure on at least one of said electrodes, the patterned electrically insulating layer structure having openings; and
a metallic structure on the patterned electrically insulating layer structure that extends through the openings of the patterned electrically insulating layer to the at least one of the electrodes, therewith directly contacting said at least one of the electrodes.
2 . Optoelectric device according to claim 1 , comprising a stack with a further layer of an optoelectric active material between a third electrode and a fourth electrode, said stack being arranged on the patterned electrically insulating layer structure provided with the metallic structure.
3 . Optoelectric device according to claim 2 , wherein both the layer of an optoelectric active material and the further layer of an optoelectric active material is a light-emitting layer.
4 . Optoelectric device according to claim 2 , wherein the layer of an optoelectric active material is a light-emitting layer and the further layer of an optoelectric active material is a photo-voltaic layer.
5 . Optoelectric device according to claim 2 , wherein the layer of an optoelectric active material is a light-emitting layer and the further layer of an optoelectric active material is an electrochromic layer.