IP Library Granted Patent US 9,539,547
Granted Patent B2
US 9,539,547 · App. 14/236,287 · Granted Jan 10, 2017

Porous film manufacturing method and apparatus

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Quick Facts
Patent No.
US 9,539,547
App. No.
14/236,287
Granted
Jan 10, 2017
Kind
B2
Abstract

A method of manufacturing a porous film includes a decomposition step of introducing a porous film precursor which is formed by coagulating an undiluted film forming solution containing a hydrophilic polymer and a hydrophobic polymer, into a decomposition container; bringing a heated chemical containing an oxidizing agent into contact with the porous film precursor in the decomposition container; warming the porous film precursor in contact with the chemical; and decomposing the hydrophilic polymer remaining inside the porous film precursor using the oxidizing agent. An apparatus for manufacturing a porous film includes a decomposition device provided with the decomposition container.

Claims (23)

1. A method of manufacturing a porous film, the method comprising:

coagulating an undiluted film forming solution comprising a hydrophilic polymer and a hydrophobic polymer, thereby obtaining a porous film precursor;

consecutively introducing the porous film precursor into a decomposition container;

bringing a heated chemical comprising an oxidizing agent into contact with the porous film precursor in the decomposition container, wherein the decomposition container is warmed by a vapor;

warming the porous film precursor in contact with the chemical by traveling the porous film precursor in the vapor phase;

decomposing the hydrophilic polymer remaining inside the porous film precursor in the presence of the oxidizing agent, and

discharging the porous film precursor from the decomposition container.

2. The method of claim 1 ,

wherein the porous film precursor to be in contact with the chemical is heated in advance.

3. The method of claim 1 ,

wherein said bringing and said warming are individually performed for a plurality of times.

4. The method of claim 3 ,

wherein

the chemical is an aqueous solution comprising sodium hypochlorite as the oxidizing agent, and

when said bringing is performed for the plurality of times, a concentration of the sodium hypochlorite in the chemical for the first contact is from 2,000 mg/L to 120,000 mg/L.

5. The method of claim 1 ,

wherein the vapor phase has a temperature of 60° C. or higher and a relative humidity of 90% or higher inside the decomposition container.

6. The method of claim 1 ,

wherein vapor is supplied to the decomposition container.

7. The method of claim 1 ,

wherein said bringing occurs by introducing the porous film precursor into the chemical.

8. The method of claim 1 ,

wherein said bringing occurs by spraying the chemical on the porous film precursor.

Assignments (2)
CHANGE OF NAME Recorded Sep 5, 2017
From: MITSUBISHI RAYON CO., LTD.
To: MITSUBISHI CHEMICAL CORPORATION
Reel/Frame 043750/0834 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 6, 2014
From: KURASHINA, MASAKI; SUMI, TOSHINORI; HIROMOTO, YASUO; FUJIKI, HIROYUKI
To: MITSUBISHI RAYON CO., LTD.
Reel/Frame 032155/0427 →