Anti-reflective coating composition providing improved scratch resistance, anti-reflective film using the same, and manufacturing method thereof

1. An anti-reflective coating composition comprising

a (meth)acrylate-based compound;

5 to 50 parts by weight of hollow particles;

1 to 30 parts by weight of a first initiator having a molecular weight of less than 420;

1 to 20 parts by weight of a second initiator having a molecular weight of 420 to 1000; and

100 to 500 parts by weight of a solvent,

based on 100 parts by weight of the (meth)acrylate-based compound.

2. The anti-reflective coating composition according to claim 1 , wherein the (meth)acrylate-based compound includes a multifunctional (meth)acrylate-based compound having 2 to 10 functional groups and a (meth)acrylate-based compound having a fluorine-containing substituent.

3. The anti-reflective coating composition according to claim 2 , wherein the (meth)acrylate-based compound includes the (meth)acrylate-based compound having a fluorine-containing substituent and the multifunctional (meth)acrylate-based compound having 2 to 10 functional groups at a weight ratio of 1:10 to 1:300.

4. The anti-reflective coating composition according to claim 2 , wherein the (meth)acrylate-based compound having a fluorine-containing substituent and the multifunctional (meth)acrylate-based compound have a surface energy difference of 5 mN/m or higher.

5. The anti-reflective coating composition according to claim 2 , wherein the multifunctional (meth)acrylate-based compound is one or more compounds selected from the group consisting of dipentaerythritol hexaacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylenepropane triacrylate, ethylene glycol diacrylate, 9,9-bis(4-(2-acryloxyethoxy)phenyl)fluorene, and bis(4-methacryloxy thiophenyl)sulfide.

6. The anti-reflective coating composition according to claim 2 , wherein the (meth)acrylate-based compound having a fluorine-containing substituent is one or more selected from the group consisting of compounds of the following Chemical Formulae 1 to 5:

wherein R1 is a hydrogen group or an alkyl group having 1 to 6 carbon atoms, a is an integer of 0 to 7, and b is an integer of 1 to 3;

wherein c is an integer of 1 to 10;

wherein d is an integer of 1 to 11;

wherein e is an integer of 1 to 5;

wherein f is an integer of 4 to 10.

7. The anti-reflective coating composition according to claim 1 , wherein the hollow particles have a number average diameter of 1 to 200 nm.

8. The anti-reflective coating composition according to claim 1 , wherein the hollow particles are hollow silica particles.

9. The anti-reflective coating composition according to claim 1 , wherein the solvent has a dielectric constant (25° C.) of 20 to 30, and a dipole moment of 1.7 to 2.8.

10. The anti-reflective coating composition according to claim 1 , wherein the solvent is one or more selected from the group consisting of methyl ethyl ketone, ethyl acetate, acetyl acetone, isobutyl ketone, methanol, ethanol, n-butanol, i-butanol, and t-butanol.

11. The anti-reflective coating composition according to claim 1 , further comprising inorganic nanoparticles having a number average diameter of 1 to 50 nm.

12. A method for manufacturing an anti-reflective film, comprising the steps of:

preparing the anti-reflective coating composition according to claim 1 ;

applying the composition onto at least one surface of a substrate film;

drying the applied composition; and

curing the dried composition layer.

13. The method for manufacturing an anti-reflective film according to claim 12 , wherein the composition applied onto the substrate film is spontaneously phase-separated into a first layer containing the initiator having the first molecular weight; and a second layer containing the hollow particles and the initiator having the second molecular weight, these layers are formed sequentially from the substrate film.

14. The method for manufacturing an anti-reflective film according to claim 12 , wherein the drying process of the composition is performed at a temperature of 5 to 150° C. for 0.1 to 60 minutes.

15. The method for manufacturing an anti-reflective film according to claim 12 , wherein the curing process of the composition is performed at a UV radiation dose of 0.1 to 2 J/cm2 for 1 to 600 seconds.