Imprint apparatus and article manufacturing method
View Patent ↗Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.
1. An imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the imprint apparatus comprising:
a substrate holder configured to hold the substrate and move in a direction along the surface of the substrate;
a gas supply unit configured to supply a first gas into a space between a pattern part of the mold and the substrate;
a first wall part including a first end portion and disposed so as to enclose a first space including the space supplied with the first gas, the first end portion of the first wall part being a bottom portion of the first wall part that faces the substrate holder or the substrate with a first gap in a state where the mold and the substrate face each other;
a second wall part including a second end portion and disposed so as to enclose the first wall part, the second end portion being a bottom portion of the second wall part that faces a top surface of the substrate holder or a top surface of the substrate with a second gap in a state where the mold and the substrate face each other; and
a gas exhaust unit configured to exhaust the first gas from a second space between the first wall part and the second wall part such that a first gas flow is directed from the first space through the first gap toward the second space and a second gas flow is directed from beneath the second end portion of the second wall part toward the second space.
2. The imprint apparatus according to claim 1 , wherein the gas supply unit comprises a supply port opposing the first space, and
the first end portion is disposed, in a direction perpendicular to the surface of the substrate, more toward the substrate holder than the supply port.
3. The imprint apparatus according to claim 1 , wherein the first end portion is disposed, in a direction perpendicular to the surface of the substrate, more distant from the substrate holder than the pattern part of the mold.
4. The imprint apparatus according to claim 1 , wherein the first gap is 1 mm or less.
5. The imprint apparatus according to claim 1 , wherein the first wall part is formed such that a flow rate of the first gas increases at the first gap.
6. The imprint apparatus according to claim 1 , wherein the first gap is set such that, during a movement of the substrate holder, a flow speed of the first gas from the first space toward the first gas flow at the first gap becomes equal to or greater than the movement speed of the substrate holder.
7. The imprint apparatus according to claim 1 ,
wherein the gas exhaust unit exhausts a second gas from the second space, the second gas is included in the second gas flow directed from beneath the second end portion of the second wall part toward the second space.
8. The imprint apparatus according to claim 7 , wherein the second gap is set such that, during a movement of the substrate holder, a flow speed of the second gas toward the second gas flow at the second gap becomes equal to or greater than a movement speed of the substrate holder.
9. The imprint apparatus according to claim 1 , further comprising an interferometer configured to measure a position of the substrate holder by using a light.
10. The imprint apparatus according to claim 1 , wherein the gas exhaust unit exhausts the first gas having passed through the first gap while the supply unit supplies the first gas.
11. The imprint apparatus according to claim 7 , wherein the second gap is set such that, during a movement of the substrate holder, a flow speed of the second gas toward the second gas flow at the second gap becomes greater than a flow speed of the first gas from the first space toward the first gas flow at the first gap.
12. The imprint apparatus according to claim 1 , wherein the first gas reduces an occurrence of unfilled portions in the imprint material.
13. The imprint apparatus according to claim 1 , wherein the first gas includes at least one of helium, carbon dioxide, nitrogen, hydrogen, xenon, or a compressible gas.
14. The imprint apparatus according to claim 1 , further comprising a mold holder movable vertically,
wherein the mold holder has the first wall part.