IP Library Granted Patent US 9,290,610
Granted Patent B2
US 9,290,610 · App. 14/255,715 · Granted Mar 22, 2016

Methods of producing polyanthracene and uses thereof

Inventors: Mei-rong Huang (Shanghai, CN); Xin-gui Li (Shanghai, CN); Shao-Jun Huang (Shanghai, CN)
Assignee: Tongji University
C08G61/10H01G9/038H01G11/56H01M10/0565C08G2261/314C08G2261/43C08G2261/70H01M2300/0082Y02E60/13
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Quick Facts
Patent No.
US 9,290,610
App. No.
14/255,715
Granted
Mar 22, 2016
Kind
B2
Abstract

The present application provides methods of producing polyanthracene including polymerization of anthracene monomers in the presence of oxidants and reaction solvents. The present application further provides polyanthracene produced by methods described herein that has higher solubility in organic solvents and better thermal stability and ablation resistance.

Claims (19)

1. A polyanthracene containing 18 or more units of anthracene monomers, wherein the anthracene monomers are represented by formula I

2. The polyanthracene of claim 1 , wherein the polyanthracene contains 19 or more units of anthracene monomers.

3. The polyanthracene of claim 1 , wherein the thermal decomposition temperature of the polyanthracene is about 300° C. to 1000° C. in the presence of nitrogen.

4. The polyanthracene of claim 1 , wherein the electrical conductivity of the polyanthracene in virgin salt state is from 10 −9 to 10 −11 S cm −1 .

5. The polyanthracene of claim 1 , wherein the electrical conductivity of the polyanthracene in virgin salt state is from about 7×10 −9 to 10 −11 S cm −1 .

6. The polyanthracene of claim 1 , wherein the char yield of the polyanthracene at 1000° C. is from 70% to 95%.

7. The polyanthracene of claim 1 , wherein the polyanthracene is at least partially soluble in an organic solvent.

8. The polyanthracene of claim 7 , wherein the organic solvent is selected from the group consisting of N-methylpyrrolidone (NMP), tetrahydrofuran (THF), chloroform, dimethylformamide (DMF), and dimethylsulfoxide (DMSO).

9. A composition comprising at least one polyanthracene, wherein the at least one polyanthracene contains 18 or more units of anthracene monomers, wherein about 5% to 80% of the at least one polyanthracene by weight contains 18 or more units of anthracene monomers, wherein the anthracene monomers are represented by formula I

10. The composition of claim 9 , wherein the weight average molecular weight of the at least one polyanthracene is no less than 3000.

11. The composition of claim 9 , wherein about 20% to 30% of the at least one polyanthracene by weight contains 18 or more units of anthracene monomers.

12. The composition of claim 9 , wherein the thermal decomposition temperature of the at least one polyanthracene is about 300° C. to 1000° C. in the presence of nitrogen.

13. The composition of claim 9 , wherein the thermal decomposition temperature of the at least one polyanthracene is 400° C. or higher in the presence of nitrogen.

14. The composition of claim 9 , wherein the electrical conductivity of the at least one polyanthracene in virgin salt state is from 10 −9 to 10 −11 S cm −1 .

15. The composition of claim 9 , wherein the char yield of the at least one polyanthracene at 1000° C. is from 70% to 95%.

16. The composition of claim 9 , wherein 5% to 100% of the at least one polyanthracene by weight is soluble in an organic solvent.

17. The composition of claim 16 , wherein the organic solvent is N-methylpyrrolidone (NMP), tetrahydrofuran (THF), chloroform, dimethylformamide (DMF), dimethylsulfoxide (DMSO), or any combination thereof.

18. The composition of claim 9 , wherein the at least one polyanthracene has at least one absorbance peak from about 380 nm to about 690 nm.

19. The composition of claim 9 , wherein the composition is a thermal resistant material, an ablation resistant material, a carbon precursor, an electrically conductive material, an anti-static electricity material, an anti-ablation paint, a rechargeable battery, an ultra-capacitor, a carrier for catalysts, or any combination thereof.

Assignments (4)
RELEASE OF SECURITY INTEREST IN PATENTS, RECORDED ON JANUARY 29, 2019 AT REEL 048373 FRAME 0217 Recorded Sep 22, 2025
From: CRESTLINE DIRECT FINANCE, L.P., AS COLLATERAL AGENT
To: EMPIRE TECHNOLOGY DEVELOPMENT LLC
Reel/Frame 072936/0464 →
RELEASE OF SECURITY INTEREST Recorded Jul 31, 2019
From: CRESTLINE DIRECT FINANCE, L.P.
To: EMPIRE TECHNOLOGY DEVELOPMENT LLC
Reel/Frame 049924/0794 →
SECURITY INTEREST Recorded Jan 29, 2019
From: EMPIRE TECHNOLOGY DEVELOPMENT LLC
To: CRESTLINE DIRECT FINANCE, L.P.
Reel/Frame 048373/0217 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 2, 2015
From: HUANG, MEI-RONG; LI, XIN-GUI; HUANG, SHAO-JUN
To: TONGJI UNIVERSITY
Reel/Frame 036717/0800 →
Continuity (2)
Division 13133143
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