Semiconductor device
View Patent ↗To provide a semiconductor device suitable for miniaturization. To provide a highly reliable semiconductor device. To provide a semiconductor device formed using an oxide semiconductor and having favorable electrical characteristics. A semiconductor device includes an island-shaped semiconductor layer over an insulating surface; a pair of electrodes in contact with a side surface of the semiconductor layer and overlapping with a part of a top surface of the semiconductor layer; an oxide layer located between the semiconductor layer and the electrode and in contact with a part of the top surface of the semiconductor layer and a part of a bottom surface of the electrode; a gate electrode overlapping with the semiconductor layer; and a gate insulating layer between the semiconductor layer and the gate electrode. In addition, the semiconductor layer includes an oxide semiconductor, and the pair of electrodes includes Al, Cr, Cu, Ta, Ti, Mo, or W.
1. A semiconductor device comprising:
a semiconductor layer over an insulating surface;
a source electrode in direct contact with a first side surface of the semiconductor layer and overlapping with a first part of a top surface of the semiconductor layer;
a drain electrode in direct contact with a second side surface of the semiconductor layer and overlapping with a second part of the top surface of the semiconductor layer;
a first oxide layer between the source electrode and the semiconductor layer and overlapping with the first part of the top surface of the semiconductor layer;
a second oxide layer between the semiconductor layer and the drain electrode and overlapping with the second part of the top surface of the semiconductor layer;
a gate electrode overlapping with the semiconductor layer; and
a gate insulating layer between the semiconductor layer and the gate electrode,
wherein the first oxide layer and the second oxide layer are separated from each other,
wherein the semiconductor layer comprises an oxide semiconductor, and
wherein the first oxide layer and the second oxide layer each has a higher sheet resistance than a region of the semiconductor layer which overlaps with the first oxide layer or the second oxide layer.
2. The semiconductor device according to claim 1 , wherein the source electrode and the drain electrode are not in contact with the top surface of the semiconductor layer.
3. The semiconductor device according to claim 1 , wherein the source electrode and the drain electrode each comprises at least one selected from the group consisting of Al, Cr, Cu, Ta, Ti, Mo, and W.
4. The semiconductor device according to claim 1 , wherein the semiconductor layer comprises In.
5. The semiconductor device according to claim 1 , wherein the semiconductor layer comprises In and Ga.
6. The semiconductor device according to claim 1 , wherein the semiconductor layer comprises In, M and Zn, where M is an element selected from the group consisting of Al, Ti, Ga, Y, Zr, La, Ce, Nd, and Hf.
7. The semiconductor device according to claim 6 ,
wherein the first oxide layer and the second oxide layer each include In, M and Zn, and
wherein a first proportion of M to In included in the first oxide layer and a second proportion of M to In included in the second oxide layer are higher than a proportion of M to In included in the semiconductor layer.
8. The semiconductor device according to claim 7 , wherein in the first oxide layer and the second oxide layer, a number of atoms of M is three or more times as large as a number of atoms of In.
9. The semiconductor device according to claim 1 , wherein the first oxide layer and the second oxide layer each include at least one selected from the group consisting of gallium oxide, Ga—Zn oxide, silicon oxide, silicon oxynitride, silicon nitride oxide, silicon nitride, aluminum oxide, and hafnium oxide.
10. The semiconductor device according to claim 1 , wherein the semiconductor layer includes a crystal part.
11. The semiconductor device according to claim 1 , wherein the gate electrode is provided over the semiconductor layer.
12. The semiconductor device according to claim 1 , wherein the semiconductor layer is provided over the gate electrode.
13. The semiconductor device according to claim 1 , further comprising a second gate electrode, wherein the semiconductor layer and the gate insulating layer are sandwiched between the gate electrode and the second gate electrode.
14. A semiconductor device comprising:
a semiconductor layer over an insulating surface;
a source electrode in direct contact with a first side surface of the semiconductor layer and overlapping with a first part of a top surface of the semiconductor layer;
a drain electrode in direct contact with a second side surface of the semiconductor layer and overlapping with a second part of the top surface of the semiconductor layer;
a first oxide layer located between the source electrode and the semiconductor layer and overlapping with the first part of the top surface of the semiconductor layer;
a second oxide layer located between the semiconductor layer and the drain electrode and overlapping with the second part of the top surface of the semiconductor layer;
a gate electrode over the semiconductor layer; and
a gate insulating layer between the semiconductor layer and the gate electrode,
wherein the first oxide layer and the second oxide layer are separated from each other in a first region,
wherein the semiconductor layer comprises an oxide semiconductor, and has a first portion in the first region,
wherein the first oxide layer and the second oxide layer each has a higher sheet resistance than a second region of the semiconductor layer which overlaps with the first oxide layer or the second oxide layer, and
wherein a thickness of the first portion of the semiconductor layer is smaller than a thickness of a second portion of the semiconductor layer in the second region.
15. The semiconductor device according to claim 14 , wherein the source electrode and the drain electrode are not in contact with the top surface of the semiconductor layer.
16. The semiconductor device according to claim 14 , wherein the source electrode and the drain electrode each comprises at least one selected from the group consisting of Al, Cr, Cu, Ta, Ti, Mo, and W.
17. The semiconductor device according to claim 14 , wherein the semiconductor layer comprises In.
18. The semiconductor device according to claim 14 , wherein the semiconductor layer comprises In, M and Zn, where M is an element selected from the group consisting of Al, Ti, Ga, Y, Zr, La, Ce, Nd, and Hf.
19. The semiconductor device according to claim 18 ,
wherein the first oxide layer and the second oxide layer each include In, M and Zn, and
wherein a first proportion of M to In included in the first oxide layer and a second proportion of M to In included in the second oxide layer are higher than a proportion of M to In included in the semiconductor layer.
20. The semiconductor device according to claim 19 , wherein in the first oxide layer and the second oxide layer, a number of atoms of M is three or more times as large as a number of atoms of In.
21. The semiconductor device according to claim 18 , wherein the first oxide layer and the second oxide layer each include at least one selected from the group consisting of gallium oxide, Ga—Zn oxide, silicon oxide, silicon oxynitride, silicon nitride oxide, silicon nitride, aluminum oxide, and hafnium oxide.
22. The semiconductor device according to claim 14 , wherein the semiconductor layer includes a crystal part.
23. The semiconductor device according to claim 1 , wherein the semiconductor layer comprises oxygen vacancies in a vicinity of an interface between the semiconductor layer and one of the source electrode and the drain electrode.