IP Library Granted Patent US 9,610,655
Granted Patent B2
US 9,610,655 · App. 14/272,127 · Granted Apr 4, 2017

Solder paste

Inventor: Deok Ki Hwang (Seoul, KR)
Assignee: LG INNOTEK CO., LTD.
B23K35/025B22F1/0003B22F1/025B23K1/0016B23K35/0244B23K35/24B23K35/262B23K35/302B23K35/36B23K35/3612H01L24/14H01L24/27H01L24/29H05K3/3463B22F2998/10C22C1/0425C22C1/0483H01L24/32H01L2224/27442H01L2224/27849H01L2224/29294H01L2224/29311H01L2224/29347H01L2224/29439H01L2224/32058H01L2224/32245H01L2224/83801H01L2924/01322H05K3/3484H05K2201/0272
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Quick Facts
Patent No.
US 9,610,655
App. No.
14/272,127
Granted
Apr 4, 2017
Kind
B2
Abstract

A solder paste includes a flux and powder mixed with the flux, where the powder includes first powder and second powder mixed with each other. The first powder may be a tin (Sn) and at least one metal dissolved in the tin (Sn), and the second powder may be a copper (Cu) powder, the surface of which is coated with silver (Ag).

Claims (40)

1. A solder paste comprising:

a flux including rosin, a thinner and an activator; and

a mixed powder mixed with the flux, the mixed powder including first powder and second powder mixed with each other,

wherein the first powder includes tin and at least one metal dissolved in the tin, and the second powder includes a copper powder, and an Ag coating film formed on a surface of the copper powder,

wherein a diameter of the copper powder included in the second powder is in a range of 4 μm to 7 μm and a thickness of the Ag coating film is 1 μm or less, and

wherein the activator is present in an amount of 40% to 60% based on the total weight of the flux.

2. The solder paste according to claim 1 , wherein the at least one metal includes copper and silver.

3. The solder paste according to claim 1 , wherein the first powder includes an alloy of tin, silver, and copper.

4. The solder paste according to claim 1 , wherein the weight of the second powder is in a range of 5% to 40% of the weight of the mixed powder.

5. The solder paste according to claim 1 , wherein the weight of the Ag coating film included in the second powder is in a range of 10% to 50% of the weight of copper powder included in the second powder.

6. The solder paste according to claim 1 , wherein a diameter of the copper powder is 4 μm, the weight of the second powder is 10% of the weight of the mixed powder and the thickness of the Ag coating film is 0.1 μm.

7. The solder paste according to claim 1 , wherein a diameter of the cooper powder is 4 μm, the weight of the second powder is 15% of the weight of the mixed powder, and the thickness of Ag coating film is 0.2 μm.

8. The solder paste according to claim 1 , wherein the at least one metal includes at least one of silver (Ag), copper (Cu), antimony (Sb), bismuth (Bi), indium (In), and zinc (Zn).

9. The solder paste according to claim 3 , wherein a ratio of the weight percentage of tin to silver to copper included in the first powder is 96.5:3:0.5.

10. The solder paste according to claim 3 , wherein the first powder is formed by breaking an alloy lump of tin, silver, and copper.

11. The solder paste according to claim 1 , wherein an oxidation initiation temperature of the second powder is 219° C. or more.

12. The solder paste according to claim 1 , wherein an oxidation initiation temperature of the second powder is higher than a range of 240° C. to 250° C.

13. The solder paste according to claim 1 , wherein the flux is liquid-phase, a solid having ductility, or a solid.

14. The solder paste according to claim 13 , wherein a diameter of the copper powder is 7 μm, the weight of the second powder is 12% of the weight of the mixed powder, and the thickness of Ag coating film is 0.2 μm.

15. The solder paste according to claim 1 , wherein a diameter of the copper powder is 7 μm, the weight of the second powder is 20% of the weight of the mixed powder, and the thickness of Ag coating film is 0.4 μm.

16. The solder paste according to claim 1 , wherein the flux further includes a gelant, and

the gelant is present in an amount of 0.1% to 10% based on the total weight of the flux.

17. A solder paste comprising:

a flux including rosin, a thinner, and an activator, and

a mixed powder mixed with the flux, the mixed powder including first powder and second powder mixed with each other,

wherein the first powder includes tin and at least one metal dissolved in the tin, and the second powder includes copper powder and a barrier coating film coated on the surface of the copper powder, and

wherein the melting temperature of the barrier coating film is equal to or higher than that of the tin,

wherein a diameter of the copper powder included in the second powder is in a range of 4 μm to 7 μm and a thickness of the barrier coating film is 1 μm or less, and

wherein the activator is present in an amount of 40% to 60% based on the total weight of the flux.

18. The solder paste according to claim 17 , wherein the barrier coating film is a silver coating film.

19. The solder paste according to claim 17 , wherein an oxidation initiation temperature of the second powder is higher than the eutectic point of the first powder.

20. A solder paste comprising:

a flux inducing rosin, a thinner, and an activator; and

a mixed powder mixed with the flux, the mixed powder including first powder and second powder mixed with each other,

wherein the first powder includes tin, silver, and copper,

wherein the second powder includes copper powder and a silver coating film over the entire surface of the copper powder,

wherein the weight of the second powder is in a range of 5% to 40% of the weight of the mixed powder, and

wherein the weight of the silver coating film included in the second powder is in a range of 10% to 50% of the weight of the copper powder included in the second powder,

wherein a diameter of the copper powder included in the second powder is in a range of 4 μm to 7 μm and a thickness of the silver coating film is 1 μm or less, and

wherein the activator is present in an amount of 40% to 60% based on the total weight of the flux.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2025
From: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
To: BOE HC SEMITEK LIMITED(HENGQIN)
Reel/Frame 070521/0027 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 25, 2021
From: LG INNOTEK CO., LTD.
To: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
Reel/Frame 056366/0335 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 7, 2014
From: HWANG, DEOK KI
To: LG INNOTEK CO., LTD.
Reel/Frame 032843/0245 →
Priority Claims (1)
KR 10-2013-0053047 · May 10, 2013 · national
Continuity (1)
Related Publication 20140332116A1 · Nov 13, 2014