Power semiconductor device with oscillation prevention
View Patent ↗There are disclosed herein various implementations of composite semiconductor devices with active oscillation control. In one exemplary implementation, a normally OFF composite semiconductor device comprises a normally ON III-nitride power transistor and a low voltage (LV) device cascoded with the normally ON III-nitride power transistor to form the normally OFF composite semiconductor device. The LV device may be configured to include one or both of a reduced output resistance due to, for example, a modified body implant and a reduced transconductance due to, for example, a modified oxide thickness to cause a gain of the composite semiconductor device to be less than approximately 10,000.
1. A normally OFF composite semiconductor device including an active oscillation control, said normally OFF composite semiconductor device comprising:
a normally ON III-nitride power transistor;
a low voltage (LV) device cascoded with said normally ON III-nitride power transistor to form said normally OFF composite semiconductor device;
said LV device having a reduced output resistance to cause a gain of said normally OFF composite semiconductor device to be less than approximately 10,000, wherein said normally ON III-nitride power transistor comprises a III-nitride field-effect transistor (III-N FET).
2. The normally OFF composite semiconductor device of claim 1 , wherein said LV device comprises an LV group IV semiconductor device.
3. The normally OFF composite semiconductor device of claim 1 , wherein said LV device comprises an LV field-effect transistor (LV FET).
4. The normally OFF composite semiconductor device of claim 1 , wherein said normally ON III-nitride power transistor and said LV device are monolithically integrated.
5. A composite semiconductor device including an active oscillation control, said composite semiconductor device comprising:
a III-nitride power transistor;
a low voltage (LV) transistor;
a drain of said LV transistor coupled to a source said III-nitride power transistor, a source of said LV transistor providing a composite source for said composite semiconductor device, and a gate of said LV transistor providing a composite gate for said composite semiconductor device, a drain of said III-nitride power transistor providing a composite drain for said composite semiconductor device, a gate of said III-nitride power transistor being coupled to said source of said LV transistor;
said LV transistor having a reduced output resistance due to a modified body implant to cause a gain of said composite semiconductor device to be less than approximately 10,000, wherein said III-nitride power transistor comprises a III-nitride field-effect transistor (III-N FET).
6. The composite semiconductor device of claim 5 , wherein said LV transistor comprises an LV group IV semiconductor transistor.
7. The composite semiconductor device of claim 5 , wherein said LV transistor comprises an LV silicon field-effect transistor (FET).
8. The composite semiconductor device of claim 5 , wherein said LV transistor is one of an LV metal-oxide-semiconductor FET (LV MOSFET) and an LV metal-insulator-semiconductor FET (LV MISFET).
9. The composite semiconductor device of claim 5 , wherein said III-nitride power transistor and said LV transistor are monolithically integrated.
10. A composite semiconductor device including an active oscillation control, said composite semiconductor device comprising:
a III-nitride power transistor;
a low voltage (LV) transistor;
a drain of said LV transistor coupled to a source said III-nitride power transistor, a source of said LV transistor providing a composite source for said composite semiconductor device, and a gate of said LV transistor providing a composite gate for said composite semiconductor device, a drain of said III-nitride power transistor providing a composite drain for said composite semiconductor device, a gate of said III-nitride power transistor being coupled to said source of said LV transistor;
said LV transistor having a reduced transconductance due to a modified oxide thickness to cause a gain of said composite semiconductor device to be less than approximately 10,000, wherein said III-nitride power transistor comprises a III-nitride field-effect transistor (III-N FET).
11. The composite semiconductor device of claim 10 , wherein said LV transistor comprises an LV group IV semiconductor transistor.
12. The composite semiconductor device of claim 10 , wherein said LV transistor comprises an LV silicon field-effect transistor (FET).
13. The composite semiconductor device of claim 10 , wherein said LV transistor is one of an LV metal-oxide-semiconductor FET (LV MOSFET) and an LV metal-insulator-semiconductor FET (LV MISFET).
14. The composite semiconductor device of claim 10 , wherein said III-nitride power transistor and said LV transistor are monolithically integrated.