Semiconductor device and method of designing the same
View Patent ↗A semiconductor device includes: a semiconductor substrate having a memory cell array region and a peripheral circuit region; a ferroelectric capacitor formed over the semiconductor substrate in the memory cell array region; and a dummy capacitor formed over the semiconductor substrate in the peripheral circuit region, with a layered structure same as that of the ferroelectric capacitor, with an area larger than that of the ferroelectric capacitor, and with a line width not larger than the width of the ferroelectric capacitor.
1. A semiconductor device comprising:
a semiconductor substrate that includes a memory cell array region and a peripheral circuit region;
a ferroelectric capacitor formed over the semiconductor substrate in the memory cell array region, with a first area and a first width; and
a dummy capacitor formed over the semiconductor substrate in the peripheral circuit region, with a layered structure same as a layer structure of the ferroelectric capacitor, with a second area larger than the first area, and with a second width not larger than the first width,
wherein the dummy capacitor includes a slit that determines the second width.
2. The semiconductor device according to claim 1 ,
further comprising a plurality of ferroelectric capacitors formed in the memory cell array region, and
wherein the width of the slit is equal to the distance between the dummy capacitor and the adjacent ferroelectric capacitors arranged in the memory cell array region.
3. The semiconductor device according to claim 1 ,
wherein the slit is formed in an interior region of the dummy capacitor.
4. The semiconductor device according to claim 1 ,
wherein the dummy capacitor is rounded at the corners in the planar shape.
5. The semiconductor device according to claim 1 ,
wherein the dummy capacitor includes a line pattern arranged serpentine-like.
6. The semiconductor device according to claim 1 ,
wherein the second width is equal to the first width.
7. The semiconductor device according to claim 1 ,
wherein the first area is the base area of the ferroelectric capacitor,
the first width is the minimum width among the base widths of the ferroelectric capacitor,
the second area is the base area of the dummy capacitor, and
the second width is the minimum width among the base widths of the dummy capacitor.
8. The semiconductor device according to claim 1 , further comprising:
an insulating film formed over the semiconductor substrate, and
a dummy plug, that is connected to the dummy capacitor, formed in the insulating film.
9. A semiconductor device comprising:
a semiconductor substrate that includes a memory cell array region and a peripheral circuit region;
an insulating film formed over the semiconductor substrate;
a ferroelectric capacitor formed over the insulating film in the memory cell array region;
a dummy plug formed in the insulating film in the peripheral circuit region; and
a dummy capacitor, that is connected to the dummy plug, formed over the insulating film in the peripheral circuit region,
wherein the dummy capacitor includes a slit that determines a width of the dummy capacitor.