OVERLAPPING PATTERN PROJECTOR
An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
1 . An optoelectronic device, comprising:
a semiconductor substrate;
an array of optical emitters, arranged on the substrate in a two-dimensional pattern;
a projection lens, which is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate; and
a diffractive optical element (DOE), which is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
2 . The device according to claim 1 , wherein the pattern has a given pitch, and wherein the multiple overlapping replicas have a combined pitch that is finer than the given pitch.
3 . The device according to claim 1 , wherein the optical emitters comprise vertical cavity surface emitting laser (VCSEL) devices.
4 . The device according to claim 1 , wherein the DOE is configured to produce the multiple replicas so as to overlap in one dimension.
5 . The device according to claim 1 , wherein the DOE is configured to produce the multiple replicas so as to overlap in two dimensions.
6 . The device according to claim 1 , wherein the two-dimensional pattern of the light-emitting elements does not lie on a regular lattice.
7 . The device according to claim 1 , wherein the two-dimensional pattern of the light-emitting elements is an uncorrelated pattern.
8 . The device according to claim 1 , wherein the two-dimensional pattern of the light-emitting elements is a regular grid pattern.
9 . The device according to claim 1 , wherein the projection lens and the DOE are formed on a single optical substrate.
10 . The device according to claim 1 , wherein the two-dimensional pattern of the light-emitting elements is divided into two or more subsets that are individually addressable, and comprising control circuitry that is configured to address combinations of one or more of the subsets so as to control the overlapping replicas for creating multiple different pattern densities.
11 . The device according to claim 1 , wherein the DOE is configured to create transversal offsets between duplication in adjacent columns of the projected optical beams, so as to reduce an ambiguity in depth estimation that is based on measuring transversal shifts in the projected optical beams along the columns.
12 . A method for producing an optoelectronic device, the method comprising:
providing a semiconductor substrate;
forming an array of optical emitters on the substrate in a two-dimensional pattern;
mounting a projection lens on the semiconductor substrate so as to collect and focus light emitted by the optical emitters, thereby projecting optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate; and
mounting a diffractive optical element (DOE) on the substrate so as to produce and project multiple overlapping replicas of the pattern.
13 . The method according to claim 12 , wherein the pattern has a given pitch, and wherein the multiple overlapping replicas have a combined pitch that is finer than the given pitch.
14 . The method according to claim 12 , wherein the optical emitters comprise vertical cavity surface emitting laser (VCSEL) devices.
15 . The method according to claim 12 , wherein the multiple replicas produced by the DOE overlap in one dimension.
16 . The method according to claim 12 , wherein the multiple replicas produced by the DOE overlap in two dimensions.
17 . The method according to claim 12 , wherein the two-dimensional pattern of the light-emitting elements does not lie on a regular lattice.
18 . The method according to claim 12 , wherein the two-dimensional pattern of the light-emitting elements is an uncorrelated pattern.
19 . The method according to claim 12 , wherein the two-dimensional pattern of the light-emitting elements is a regular grid pattern.
20 . The method according to claim 12 , wherein mounting the projection lens and the DOE comprises forming the projection lens and the DOE on a single optical substrate.
21 . The method according to claim 12 , wherein the two-dimensional pattern of the light-emitting elements is divided into two or more subsets that are individually addressable, and comprising providing control circuitry that addresses combinations of one or more of the subsets so as to control the overlapping replicas for creating multiple different pattern densities.
22 . The method according to claim 12 , wherein the DOE creates transversal offsets between adjacent columns of the projected optical beams, so as to reduce an ambiguity in depth estimation that is based on measuring transversal shifts in the projected optical beams along the columns.