Scratch resistant touch sensor

1. A method of manufacturing a flexible scratch resistant, touch sensor, comprising:

forming a first plurality of conductive lines on a first surface of a heat stabilized substrate;

forming a second plurality of conductive lines, oriented orthogonal to the first plurality of conductive lines, on an opposite surface of the heat stabilized substrate;

forming a tail comprising a first set of leads and connectors connecting with the first plurality of conductive lines, and a second set of leads and connectors connecting with the second plurality of conductive lines;

preparing a protective coating solution by mixing 70%-80% of multifunctional acrylic oligomers, 20%-30% solvent, and 1%-6% photoinitiators;

applying the protective coating solution over the first surface and the opposite surface of the heat stabilized substrate to thereby coat the first and second plurality of conductive lines; and

forming a cross-linked polymer structure by curing the protective coating solution.

2. The method of claim 1 wherein curing the protective coating solution is conducted in an environment of an inert gas.

3. The method of claim 1 wherein forming the cross-linked polymer structure achieves a cross-link density of 50% or higher.

4. The method of claim 1 wherein applying the protective coating solution comprises dipping the touch sensor into a vessel containing the protective coating solution.

5. The method of claim 1 wherein applying the protective coating solution comprises a flexographic printing process.

6. The method of claim 1 wherein applying the protective coating solution comprises either a slot-die or Gravure coating technique.

7. The method claim 1 wherein curing the protective coating solution comprises applying a UV light source having a wavelength from 280 to 480 nm at an intensity density of 0.5-20.0 J/cm 2 .

8. The method of claim 1 wherein curing the protective coating solution comprises applying ionizing radiation to the protective coating solution.

9. The method of claim 8 wherein applying the ionizing radiation comprises applying doses of electrons ranging from 0.5 to 5 MRads.