Transparent conductive electrodes comprising surface functionalized metal nanowires, their structure design, and method of making such structures
Discloses herein is a method to make a surface functionalized metal nanowire. The surface functionalized metal nanowire retains the electrical conductivity but lose the luster. This is a key enabler for making ultra-low haze (haze <0.5) silver nanowire based conductive film.
1 . A method to prepare a hybrid metal nanowire, comprises
synthesizing a metal nanowire;
purifying the metal nanowire;
suspending the purified metal nanowire in a solution;
adding an acid or oxidative reagent to the nanowire solution and mixing for a short period of time at a temperature, and
collecting the hybrid metal nanowire,
wherein the hybrid metal nanowire has a core shell structure.
2 . The method of claim 1 , wherein the metal is silver.
3 . The method of claim 1 , wherein the acid is inorganic acid.
4 . The method of claim 3 , wherein the inorganic acid is selected from hydrochloric acid, HBr, HI and sulfuric acid, or mixtures thereof.
5 . The method of claim 1 , wherein the acid is organic acid.
6 . The method of claim 5 , wherein the organic acid is acetic acid and formic acid, or mixtures thereof.
7 . The method of claim 1 , wherein the oxidative agent is hydrogen chloride, potassium permanganate, or mixtures thereof.
8 . The method of claim 1 , further comprises
diluting the nanowire solution with water after reacting with acid and transferring the diluted solution for purification immediately after the dilution.
9 . The method of claim 1 , wherein the temperature is between 5-50 C.
10 . The method of claim 1 , wherein the nanowire solution has a concentration between 0.1-5 wt %.
11 . The method of claim 1 , wherein the short period of time is between 5-500 seconds.
12 . A transparent conductive film, comprising
a substrate;
a networked metal nanowires prepared by the method of claim 1 .
13 . The conductive film of claim 12 has a haze value of less than 0.5.
14 . The conductive film of claim 13 has sheet resistance of less than 300 Omh/sq.