Process for reactor passivation

1. A process for passivating a surface of a dehydrochlorination reactor comprising: stopping a flow of hydrochlorofluoropropane to a reactor, passing a gas mixture comprising hydrogen gas through the reactor at a temperature of at least 25° C. for a period of time sufficient to restore the selectivity of a dehydrochlorination reaction, stopping the flow of the hydrogen gas mixture, and resuming the flow of hydrochlorofluoropropane to the dehydrochlorination reaction, wherein the gas mixture further comprises an inert diluent gas, and wherein the concentration of hydrogen gas in said gas mixture is at least 0.5% by mole percent.

2. The process of claim 1 , wherein the concentration of hydrogen gas in said gas mixture is at least 3% by mole percent.

3. The process of claim 1 , wherein the concentration of hydrogen gas in said gas mixture is at least 10% by mole percent.

4. The process of claim 1 wherein said inert diluent gas is nitrogen, helium, argon or neon and mixtures thereof.

5. The process of claim 1 , wherein the process is maintained at a pressure of at least one atmosphere.

6. The process of claim 1 , wherein the reactor is maintained at a temperature of at least 200° C.

7. The process of claim 1 , wherein the selectivity for dehydrochlorination is increased to at least 90%.

8. The process of claim 1 , wherein the selectivity for dehydrochlorination is increased to at least 95%.

9. A process for producing a fluoropropene of formula CF 3 CX═CX 2 , wherein each X is F or H, at least one X is H and at least one X is F, comprising:

pyrolyzing a hydrochlorofluoropropane of formula CF 3 CXYCX 2 Y, wherein each X is F or H, at least one X is H, and at least one X is F and one Y is Cl and the other Y is H, in the gas-phase in the absence of a catalyst in a reaction vessel, maintained at a temperature high enough to effect the pyrolysis of said hydrochlorofluoropropane to said fluoropropene, and wherein said reaction vessel is periodically subjected to a passivation step to passivate the inner surface of said reaction vessel, wherein said passivation step comprises

(i) stopping the flow of hydrochlorofluoropropane to the reaction vessel, passing a gas mixture comprising hydrogen gas through the reactor at a temperature of at least 200° C. for a period of time sufficient to restore the selectivity of a dehydrochlorination reaction, stopping the flow of the gas mixture, and resuming the flow of hydrochlorofluoropropane to resume the pyrolysis reaction, or

(ii) introducing a flow of a gas mixture comprising hydrogen gas into said reactor while the flow of hydrochlorofluoropropane is continuing, for a time sufficient to maintain the selectivity of the dehydrochlorination reaction, and then discontinuing said flow of said gas mixture comprising hydrogen

wherein the gas mixture further comprises an inert diluent gas, and wherein the concentration of hydrogen gas in said gas mixture is at least 0.5% by mole percent.

10. The process of claim 9 , wherein the inert diluent gas is nitrogen, helium, argon or neon.

11. The process of claim 9 , wherein the passivation step is performed after 2000 hours of operation.

12. The process of claim 9 , wherein the passivation step is performed after 50 hours of operation.

13. The process of claim 9 , wherein the hydrogen gas in said gas mixture is at least 3% by mole percent.

14. The process of claim 9 , wherein the selectivity of said dehydrochlorination reaction is increased to at least 90%.

15. The process of claim 9 , wherein the selectivity of said dehydrochlorination reaction is increased to at least 95%.

16. The process of claim 9 , wherein said passivation step (ii) is conducted at a temperature of at least 400° C.

17. A process for producing a fluoropropene of formula CF 3 CX═CX 2 , wherein each X is F or H, at least one X is H and at least one X is F, comprising:

pyrolyzing a hydrochlorofluoropropane of formula CF 3 CXYCX 2 Y, wherein each X is F or H, at least one X is H, and at least one X is F and one Y is Cl and the other Y is H, in the gas-phase in the absence of a catalyst in a reaction vessel, maintained at a temperature high enough to effect the pyrolysis of said hydrochlorofluoropropane to said fluoropropene, and wherein said hydrochlorofluoropropane comprises less than 300 ppm of hydrogen fluoride.

18. A process for passivating a surface of a dehydrochlorination reactor comprising:

stopping a flow of hydrochlorofluoropropane to a reactor,

passing a gas mixture comprising a reducing agent comprising carbon monoxide (CO) and optionally other reducing agents selected from NH 3 , CH 4 , hydrogen and combinations thereof, optionally mixed with one or more inert diluents, through the reactor at a temperature of at least 25° C. for a period of time sufficient to restore the selectivity of a dehydrochlorination reaction, or (ii) a reducing agent comprising NH 3 optionally mixed with one or more inert diluents, through the reactor at a temperature of at least 430° C. for a period of time sufficient to restore the selectivity of a dehydrochlorination reaction,

stopping the flow of the gas mixture, and

resuming the flow of hydrochlorofluoropropane to the dehydrochlorination reaction.

19. The process of claim 18 wherein the NH 3 is mixed with nitrogen.

20. The process of claim 1 wherein the concentration of hydrogen gas in said gas mixture is 0.5 mole percent to 30 mole percent.

21. The process of claim 20 wherein the concentration of hydrogen gas in said gas mixture is 3 mole percent to 30 mole percent.