Apparatus for gas cleaning
The invention proposes an apparatus for gas cleaning having a high gas cleaning efficiency at any relative humidity. The apparatus comprises a passage ( 10 ) for gas flow; a hydrophilic carrier ( 12 ) permeable for gas flow, at least part of which is positioned within said passage for gas flow, and configured for containing a reagent that contacts the gas in said passage for gas flow; a unit ( 14 ) for disposing liquid to said carrier; and a controller ( 16 ), associated with said unit for disposing liquid, configured for controlling the unit for disposing to dispose an aqueous solution of dissolved reagent to the carrier; and after that controlling the unit for disposing to dispose liquid in case the humidity of the gas is below a first humidity threshold, or to stop disposing liquid in case the humidity of the gas is above a second humidity threshold.
1. An apparatus for gas cleaning, comprising:
a passage for gas flow;
a hydrophilic carrier permeable for gas flow, at least part of which is positioned within said passage for gas flow and configured for containing a reagent that contacts the gas in said passage for gas flow;
a unit for disposing liquid to said carrier; and
a controller, associated with said unit for disposing, configured for:
controlling the unit to dispose an aqueous solution of dissolved reagent to the carrier; and after that
controlling the unit to dispose liquid in case the humidity of the gas entering said carrier is below a first humidity threshold, or to stop disposing liquid in case the humidity of the gas entering said carrier is above a second humidity threshold.
2. An apparatus for gas cleaning according to claim 1 , further comprising:
a unit for activating gas flow through said passage.
3. An apparatus for gas cleaning according to claim 1 , further comprising:
a humidity sensor associated with said controller, the humidity sensor being at least partly disposed within the passage for gas flow.
4. An apparatus for gas cleaning according to claim 3 , wherein said humidity sensor is positioned on the upstream side of the carrier where the gas flow through the passage enters the carrier.
5. An apparatus for gas cleaning according to claim 4 , wherein the humidity sensor measures the relative humidity of the gas entering the carrier, and the first and the second humidity thresholds are chosen at a relative humidity value between 40% and 60%.
6. An apparatus for gas cleaning according to claim 1 , further comprising:
a timer associated with said controller;
the controller is configured to trigger the unit for disposing to resume the disposal of the aqueous solution of dissolved reagent for a certain period of time, after a period of time has elapsed since the last disposal of the aqueous solution of the dissolved reagent.
7. An apparatus for gas cleaning according to claim 6 , wherein the disposing rate of the aqueous solution of dissolved reagent of the unit for disposing is not less than the rate of evaporation of the liquid on the carrier.
8. An apparatus for gas cleaning according to claim 1 , wherein the unit for disposing comprises:
a container for containing the solution;
a manifold in liquid communication with the container, wherein at least part of the manifold is positioned above the carrier, the manifold featuring at least one aperture for enabling the disposing of the solution from the manifold onto the carrier.
9. An apparatus for gas cleaning according to claim 8 , wherein the unit for disposing further comprises:
a collector, positioned below the carrier and in liquid communication with the container.
10. An apparatus for gas cleaning according to claim 1 , wherein, the controller is for controlling the unit for disposing to keep disposing water or the aqueous solution of dissolved reagent in case the humidity of the gas is below the first humidity threshold.