Vertical centrifugal thin film evaporator and monomer purification method
A vertical centrifugal thin film evaporator is equipped with: a cylindrical body in which an central axis of a circle is set in a vertical direction; a rotor that rotates an interior of the cylindrical body in a circumferential direction thereof; a wiper that slides on an inner circumferential surface of the cylindrical body; a fixing support that fixes the wiper and is mounted on the rotor; and a heater that heats a circumferential surface of the cylindrical body. A liquid-withdrawing structure that communicates between a space surrounded by the wiper and the fixing support and a space outside the wiper and the fixing support is formed on at least one of the wiper and the fixing support, thereby preventing a liquid to be processed from being retained between the wiper and the fixing support.
1. A vertical centrifugal thin film evaporator comprising:
a cylindrical body in which a central axis of a circle is set in a vertical direction,
a rotor configured to rotate an interior of the cylindrical body in a circumferential direction thereof,
a wiper configured to slide on an inner circumferential surface of the cylindrical body,
a fixing support configured to fix the wiper and mounted on the rotor, and
a heater configured to heat a circumferential surface of the cylindrical body,
wherein at least one wiper and the fixing support has a liquid-withdrawing structure in the radial direction of the rotor (Y direction) that communicates between a space surrounded by the wiper and the fixing support and a space outside the wiper and the fixing support, and
the X direction indicates a tangential direction to the rotor, the Y direction indicates a radial direction of the rotor, and the Z direction indicates a vertical direction.
2. The vertical centrifugal thin film evaporator according to claim 1 , wherein the wiper has a through-hole formed as the liquid-withdrawing structure.
3. The vertical centrifugal thin film evaporator according to claim 1 , wherein the wiper has a notch formed as the liquid-withdrawing structure.
4. The vertical centrifugal thin film evaporator according to claim 1 , wherein the fixing support has a through-hole formed as the liquid-withdrawing structure.
5. A monomer purification method, said method comprising
purifying a liquid with the vertical centrifugal thin film evaporator of claim 1 , wherein said liquid comprises a monomer having a vinyl group.
6. The vertical centrifugal thin film evaporator according to claim 2 , wherein the wiper has a notch formed as the liquid-withdrawing structure.
7. The vertical centrifugal thin film evaporator according to claim 2 , wherein the fixing support has a through-hole formed as the liquid-withdrawing structure.
8. The vertical centrifugal thin film evaporator according to claim 3 , wherein the fixing support has a through-hole formed as the liquid-withdrawing structure.
9. The method according to claim 5 , wherein the monomer having the vinyl group is one or more of (meth)acrylic acid; alkyl (meth)acrylate such as methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, stearyl (meth)acrylate, 2-ethyl hexyl (meth)acrylate, or lauryl (meth)acrylate; cyclohexyl (meth)acrylate; phenyl (meth)acrylate; benzyl (meth)acrylate; isobornyl (meth)acrylate; glycidyl (meth)acrylate; tetrahydrofurfuryl (meth)acrylate; allyl (meth)acrylate, trifluoroethyl (meth)acrylate; dialkylaminoethyl (meth)acrylate such as dimethylaminoethyl (meth)acrylate, dimethylaminoethylmethyl chloride salt (meth)acrylate, dimethylaminoethylbenzyl chloride salt (meth)acrylate, or diethylaminoethyl (meth)acrylate; di and tri(meth)acrylate such as ethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, 1,3-butylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, polybutylene glycol di(meth)acrylate, or trimethylol propane tri(meth)acrylate; and hydroxyalkyl (meth)acrylate such as 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-methoxyethyl (meth)acrylate, and 2-ethoxyethyl (meth)acrylate.
10. The method according to claim 5 , wherein the purification is done at a pressure of from 0.01 to 80 kPa.
11. The method according to claim 5 , wherein a temperature setting of the inner circumferential surface is from 50 to 120° C. and a speed of rotation is from 10 to 200 rpm.
12. The vertical centrifugal thin film evaporator according to claim 1 , wherein the wiper, the fixing support, or both have a through hole formed in the radial direction of the rotor (Y direction).