Cavitand compositions and methods of use thereof
Cavitand compositions that comprise void spaces are disclosed. The void spaces may be empty, which means that voids are free of guest molecules or atoms, or the void spaces may comprise guest molecules or atoms that are normally in their gas phase at standard temperature and pressure. These cavitands may be useful for industrial applications, such as the separation or storage of gasses. Novel cavitand compounds are also disclosed.
1. A composition comprising a compound of formula (I):
and/or stereoisomers thereof; wherein
R is H, C 1 -C 6 alkyl, halo, or NO 2 ;
R 1 is H, C 1 -C 6 alkyl, Ph, (C 1 -C 6 alkyl) x Ph, (C(halo) 3 ) x Ph, or (halo) x Ph;
Y is —CH 2 —; and
x is an integer from 1-3;
wherein the composition is in a crystalline form that comprises void spaces of at least 15 Å 3 ; and
wherein the void spaces are free of other atoms and molecules.
2. The composition of claim 1 ; wherein for the compound of formula (I):
R is H, CH 3 , Br, or NO 2 ; and
R 1 is H, CH 3 , CH 2 CH 3 , i-Bu, Ph, 4-CH 3 Ph, 4-CF 3 Ph, 3,5-(CF 3 ) 2 Ph, or 3,5-F 2 Ph.
3. The composition of claim 1 ; wherein for the compound of formula (I):
R is H; and
R 1 is H, i-Bu, 4-CF 3 Ph, 3,5-(CF 3 ) 2 Ph, or 3,5-F 2 Ph.
4. The composition of claim 1 ; wherein for the compound of formula (I):
R is CH 3 ;
R 1 is CH 2 CH 3 , i-Bu, 3,5-(CF 3 ) 2 Ph.
5. The composition of claim 1 ; wherein for the compound of formula (I):
R is NO 2 ; and
R 1 is H or CH 3 .
6. The composition of claim 1 ; wherein for the compound of formula (I):
R is H, CH 3 , or Br; and
R 1 is H, CH 3 , CH 2 CH 3 , Ph, or 4-CH 3 Ph.
7. The composition of claim 1 ; wherein the compound of formula (I) is the rccc or the rctt stereoisomer; and wherein the compound of formula (I) is at least 95% stereoisomerically pure.
8. The composition of claim 1 ; wherein the compound of formula (I) is formula (Ia):
and/or stereoisomers thereof.
9. The composition of claim 1 ; wherein the compound of formula (I) is selected from the following (R, R 1 , Y):
(H, CH 3 , CH 2 ); (H, i-Bu, CH 2 ); (H, 4-CF 3 Ph, CH 2 ); (H, 3,5-F 2 Ph, CH 2 ); (CH 3 , 3,5-(CF 3 ) 2 Ph, CH 2 ); (CH 3 , CH 3 CH 2 , CH 2 ); (CH 3 , i-Bu, CH 2 ); and (NO 2 , H, CH 2 ).
10. The composition of claim 1 ; wherein the compositions comprise void spaces of 20 Å 3 to 300 Å 3 .
11. The composition of claim 1 ; wherein thermogravimetric analysis (TGA) of the composition reveals no more than 1% mass loss up to the temperature of sublimation of the composition.
12. The composition of claim 1 ;
wherein the composition is capable of forming a host-guest complex with one or more guest gas molecules within its void spaces; and
wherein the guest gas is selected from one or more C 1 hydrocarbon gasses, C 2 hydrocarbon gasses, and C 3 hydrocarbon gasses.
13. A chemical compound of formula (IIa);
and/or stereoisomers thereof; wherein
R 4 is i-Bu, 4-CF 3 Ph, 3,5-(CF 3 ) 2 Ph, or 3,5-F 2 Ph; and
Z is —CH 2 —.
14. A chemical compound of formula (IIb):
and/or stereoisomers thereof; wherein
R 4 is CH 2 CH 3 , i-Bu, or 3,5-(CF 3 ) 2 Ph; and
Z is —CH 2 —.
15. A chemical compound of formula (IIc):
and/or stereoisomers thereof; wherein
R 4 is H, C 1 -C 6 alkyl, Ph, (C 1 -C 6 alkyl) x Ph, (C(halo) 3 ) x Ph, or (halo) x Ph; and
Z is —CH 2 —;
wherein x is an integer from 1-3.
16. The compound of claim 15 ; wherein R 4 is H or CH 3 and Z is CH 2 .