IP Library Granted Patent US 9,594,238
Granted Patent B2
US 9,594,238 · App. 14/401,526 · Granted Mar 14, 2017

Aberration correction device and laser microscope

Inventors: Kenji Matsumoto (Tokyo, JP); Ayano Tanabe (Tokyo, JP); Nobuyuki Hashimoto (Saitama, JP); Makoto Kurihara (Saitama, JP); Masafumi Yokoyama (Tokyo, JP)
Assignee: CITIZEN WATCH CO., LTD.
G02B21/0072G02B21/0032G02B21/06G02B27/0031G02F1/01G02F1/1313G02F1/1393G02F1/13306G02F1/134309G02B5/1814G02B5/3016G02B5/3083G02B26/06G02B27/0068G02B27/283G02F1/0311G02F1/1347G02F1/13363G02F1/19G02F2203/12G02F2203/18G02F2203/50
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Quick Facts
Patent No.
US 9,594,238
App. No.
14/401,526
Granted
Mar 14, 2017
Kind
B2
Abstract

An aberration correction device ( 3 ) corrects wave front aberration arising in an optical system that includes an object lens ( 4 ) disposed in an optical path for light beams output by a coherent light source ( 1 ). The aberration correction device ( 3 ) has a symmetrical aberration correction element ( 3 a ) that corrects symmetrical aberrations, which are the wave front aberrations that are symmetrical with respect to the optical axis among the wave front aberrations generated in the optical path, and an asymmetrical aberration correction element ( 3 b ) that corrects asymmetrical aberrations, which are wave front aberrations that are asymmetrical with respect to the optical axis, generated in light beams incident obliquely on the object lens ( 4 ).

Claims (28)

1. An aberration correction device for correcting wave front aberrations generated by an optical system including an objective lens disposed on an optical path of a light flux of coherent light to be emitted from a coherent light source, comprising:

a symmetrical aberration correction element which corrects symmetrical aberrations among the wave front aberrations generated on the optical path, the symmetrical aberrations being wave front aberrations symmetrical with respect to an optical axis;

an asymmetrical aberration correction element which corrects asymmetrical aberrations generated with respect to the light flux obliquely incident on the objective lens with a viewing angle at a periphery of an irradiation area of the coherent light, the asymmetrical aberrations being wave front aberrations asymmetrical with respect to the optical axis; and

a control circuit configured to calculate a phase distribution pattern of the asymmetrical aberrations by adding the asymmetrical aberrations according to the viewing angle to residual aberrations of the symmetrical aberrations that remain after the correction of the symmetrical aberration by the symmetrical aberration correction element and depend on positional deviation due to oblique incidence of the light flux, obtain a phase modulation profile by inverting the phase distribution pattern, and make the asymmetrical aberration correction element display the phase modulation profile.

2. The aberration correction device according to claim 1 , wherein

the aberration correction device includes an effective region disposed on the optical path between the coherent light source and the objective lens at a position different from a position of a pupil of the objective lens, the effective region having a size larger than a size of the pupil of the objective lens so as to correct the wave front aberrations.

3. The aberration correction device according to claim 1 , wherein

the symmetrical aberration correction element and the asymmetrical aberration correction element are disposed along the optical axis.

4. The aberration correction device according to claim 3 , wherein

each of the symmetrical aberration correction element and the asymmetrical aberration correction element is a liquid crystal element.

5. The aberration correction device according to claim 1 , wherein

the symmetrical aberration correction element corrects the symmetrical aberrations by imparting, to the light flux, a phase modulation amount in accordance with a first phase modulation profile which is obtained by inverting a phase distribution pattern of first-order spherical aberration to be obtained by resolving the wave front aberrations corresponding to the symmetrical aberrations into Zernike polynomials.

6. The aberration correction device according to claim 1 , wherein

the symmetrical aberration correction element corrects the symmetrical aberrations by imparting, to the light flux, a phase modulation amount in accordance with a first phase modulation profile which is obtained by inverting a phase distribution pattern constituted of a sum of a phase distribution pattern of first-order spherical aberration and a phase distribution pattern of second-order spherical aberration to be obtained by resolving the wave front aberrations corresponding to the symmetrical aberrations into Zernike polynomials.

7. A laser microscope comprising:

a light source which irradiates a light flux of coherent light;

a first optical system which scans a specimen with the light flux from the light source;

an objective lens which focuses the light flux on the specimen;

a detector;

a second optical system which transmits, to the detector, a second light flux including specimen information output from the specimen by incidence of the light flux on the specimen; and

an aberration correction device which is disposed between the light source and the objective lens

wherein

the aberration correction device comprises:

a symmetrical aberration correction element which corrects symmetrical aberrations among wave front aberrations generated on an optical path of the coherent light, the symmetrical aberrations being wave front aberrations symmetrical with respect to an optical axis of the objective lens;

an asymmetrical aberration correction element which corrects asymmetrical aberrations generated with respect to the light flux of the coherent light obliquely incident on the objective lens with a viewing angle at a periphery of an irradiation area of the coherent light, the asymmetrical aberrations being wave front aberrations asymmetrical with respect to the optical axis; and

a control circuit configured to calculate a phase distribution pattern of the asymmetrical aberrations by adding the asymmetrical aberrations according to the viewing angle to residual aberrations of the symmetrical aberrations that remain after the correction of the symmetrical aberration by the symmetrical aberration correction element and depend on positional deviation due to oblique incidence of the light flux, obtain a phase modulation profile by inverting the phase distribution pattern, and make the asymmetrical aberration correction element display the phase modulation profile.

8. The laser microscope according to claim 7 , wherein

the aberration correction device is disposed, on a side of the light source than the objective lens, at a position between the objective lens, and the first optical system and the second optical system.

Assignments (2)
CHANGE OF NAME Recorded Mar 6, 2017
From: CITIZEN HOLDINGS CO., LTD.
To: CITIZEN WATCH CO., LTD.
Reel/Frame 041895/0640 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 16, 2014
From: MATSUMOTO, KENJI; TANABE, AYANO; HASHIMOTO, NOBUYUKI; KURIHARA, MAKOTO; YOKOYAMA, MASAFUMI
To: CITIZEN HOLDINGS CO., LTD.
Reel/Frame 034180/0237 →
Priority Claims (2)
JP 2012-113165 · May 17, 2012 · national
JP 2013-015611 · Jan 30, 2013 · national
Continuity (1)
Related Publication 20150116812A1 · Apr 30, 2015