IP Library Granted Patent US 9,291,722
Granted Patent B2
US 9,291,722 · App. 14/409,828 · Granted Mar 22, 2016

Scintillator plate

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Quick Facts
Patent No.
US 9,291,722
App. No.
14/409,828
Granted
Mar 22, 2016
Kind
B2
Abstract

A scintillator plate includes a substrate, a buffer layer, a scintillator layer arranged on the buffer layer, and a protective layer. The buffer layer and/or the protective layer is colored. A method for the production of the scintillator plate is also described.

Claims (11)

1. A method for manufacturing a scintillator plate, the method comprising:

providing a substrate;

applying a buffer layer to the substrate;

applying a scintillator layer to the substrate;

applying a protective layer to the scintillator layer;

wherein the buffer layer, the protective layer, or both the buffer layer and the protective layer are colored by tempering following the application thereof, wherein the tempering is implemented in a temperature range from 190° C. to 240° C. in an oxygen-containing atmosphere.

2. The method of claim 1 , wherein the buffer layer, the protective layer, or both the buffer layer and the protective layer are made of one of parylene C, parylene N and parylene D.

3. The method of claim 2 , wherein the scintillator layer forms microstructures such that interstices form between the microstructures essentially perpendicularly to the surface of the scintillator plate toward the substrate, wherein the protective layer penetrates into the interstices during application.

4. The method of claim 1 , wherein the scintillator layer forms microstructures such that interstices form between the microstructures essentially perpendicularly to the surface of the scintillator plate toward the substrate, wherein the protective layer penetrates into the interstices during application.

5. The method of claim 4 , wherein the scintillator layer comprises caesium iodide.

6. The method of claim 1 , wherein the scintillator layer forms microstructures such that interstices form between the microstructures essentially perpendicularly to the surface of the scintillator plate toward the substrate, wherein the protective layer penetrates into the interstices during application.

Assignments (4)
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE PREVIOUSLY RECORDED AT REEL: 066088 FRAME: 0256. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jan 17, 2024
From: SIEMENS HEALTHCARE GMBH
To: SIEMENS HEALTHINEERS AG
Reel/Frame 071178/0246 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 20, 2023
From: SIEMENS HEALTHCARE GMBH
To: SIEMENS HEALTHINEERS AG
Reel/Frame 066088/0256 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 21, 2016
From: SIEMENS AKTIENGESELLSCHAFT
To: SIEMENS HEALTHCARE GMBH
Reel/Frame 040656/0054 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2015
From: FUCHS, MANFRED; KORINTH, JÜRGEN
To: SIEMENS AKTIENGESELLSCHAFT
Reel/Frame 036422/0793 →