Method for producing an optoelectronic semiconductor chip with reflective electrode

1. A method for producing an optoelectronic semiconductor chip, the method comprising:

arranging a metallic mirror layer on a top side of a semiconductor layer sequence;

arranging a mirror protection layer at least on exposed lateral surfaces of the metallic mirror layer in a self-aligning manner, wherein the metallic mirror layer has openings toward the semiconductor layer sequence, and wherein the openings are framed in lateral directions by the mirror protection layer;

partially removing the semiconductor layer sequence in a region of the openings of the metallic mirror layer;

before arranging the mirror protection layer on the exposed lateral surfaces of the metallic mirror layer in a self-aligning manner, arranging at least one intermediate protection layer on the top side of the metallic mirror layer facing away from the semiconductor layer sequence; and

while arranging the mirror protection layer on the exposed lateral surfaces of the metallic mirror layer, covering exposed lateral surfaces of the at least one intermediate protection layer by the mirror protection layer,

wherein the mirror protection layer is arranged to the exposed lateral surfaces of the metallic mirror layer before partially removing the semiconductor layer sequence.

2. The method according to claim 1 , wherein arranging the mirror protection layer on the exposed lateral surfaces of the metallic mirror layer in a self-aligning manner comprises:

arranging the mirror protection layer on the top side of the metallic mirror layer facing away from the semiconductor layer sequence, wherein the mirror protection layer has openings toward the metallic mirror layer;

removing the metallic mirror layer in a region of the openings of the mirror protection layer to create the openings in the metallic mirror layer, wherein the mirror protection layer protrudes in the lateral directions beyond the exposed lateral surfaces of the metallic mirror layer, and wherein the lateral surfaces are exposed in the openings of the metallic mirror layer; and

softening the mirror protection layer such that at least a part of the mirror protection layer which protrudes beyond the exposed lateral surfaces of the metallic mirror layer in the lateral directions flows along the exposed lateral surfaces of the metallic mirror layer and covers the lateral surfaces.

3. The method according to claim 2 , wherein arranging the mirror protection layer on the top side of the metallic mirror layer comprises forming a photo structurable material on the top side of the metallic mirror layer.

4. The method according to claim 1 , wherein arranging the mirror protection layer on the exposed lateral surfaces of the metallic mirror layer in a self-aligning manner comprises conformally depositing the mirror protection layer on the top side and the exposed lateral surfaces of the metallic mirror layer, the top side facing away from the semiconductor layer sequence.

5. The method according to claim 4 , wherein conformally depositing the mirror protection layer comprises depositing an oxide or a nitride, and further comprises performing at least one of the methods selected from the group consisting of plasma-assisted chemical gas phase deposition, atomic layer deposition, chemical gas phase deposition, gas phase deposition, sputtering, and vapor deposition.

6. The method according to claim 1 , wherein, while structuring of the intermediate protection layer and the metallic mirror layer, implementing a chamfer underneath the intermediate protection layer thereby retracting the metallic mirror layer in the lateral directions in relation to the intermediate protection layer.

7. The method according to claim 1 , wherein the metallic mirror layer comprises silver, and wherein partially removing the semiconductor layer sequence comprises etching the semiconductor layer sequence using a halide-containing material.

8. The method according to claim 1 , wherein partially removing the semiconductor layer sequence comprises penetrating an active region in the semiconductor layer sequence and exposing lateral surfaces of the active region, and further comprising after exposing the lateral surfaces of the active region, arranging a further protection layer in a self-aligning manner on the exposed lateral surfaces of the active region.

9. The method according to claim 8 , wherein arranging the further protection layer in a self-aligning manner comprises conformally depositing the further protection layer on the top side of the metallic mirror layer facing away from the semiconductor layer sequence and the exposed lateral surfaces of the active region.

10. The method according to claim 8 , further comprising:

exposing a semiconductor buffer region on a side of the active region facing away from the metallic mirror layer; and

applying an electrically conductive material to the semiconductor buffer region thereby extending the electrically conductive material along the further protection layer.

11. The method according to claim 8 , wherein the active region or the further protection layer protrudes beyond the metallic mirror layer in the lateral directions after exposing the lateral surfaces of the active region, and wherein the active region or the further protection layer protrudes beyond the metallic mirror layer by at most 2000 nm.

12. The method according to claim 1 , wherein an intermediate protection layer or the mirror protection layer remain in the finished optoelectronic semiconductor chip.

13. The method according to claim 12 , wherein the lateral surfaces of the semiconductor layer sequence are free of the mirror protection layer.

14. A method for producing an optoelectronic semiconductor chip, the method comprising:

arranging a metallic mirror layer on a top side of a semiconductor layer sequence;

arranging a mirror protection layer at least on exposed lateral surfaces of the metallic mirror layer in a self-aligning manner, wherein the metallic mirror layer has openings toward the semiconductor layer sequence, and wherein the openings are framed in lateral directions by the mirror protection layer; and

partially removing the semiconductor layer sequence in a region of the openings of the metallic mirror layer,

wherein arranging the mirror protection layer on the exposed lateral surfaces of the metallic mirror layer in a self-aligning manner comprises:

arranging the mirror protection layer on the top side of the metallic mirror layer facing away from the semiconductor layer sequence, wherein the mirror protection layer has openings toward the metallic mirror layer;

removing the metallic mirror layer in a region of the openings of the mirror protection layer to create the openings in the metallic mirror layer, wherein the mirror protection layer protrudes in the lateral directions beyond the exposed lateral surfaces of the metallic mirror layer, and wherein the lateral surfaces are exposed in the openings of the metallic mirror layer; and

softening the mirror protection layer such that at least a part of the mirror protection layer which protrudes beyond the exposed lateral surfaces of the metallic mirror layer in the lateral directions flows along the exposed lateral surfaces of the metallic mirror layer and covers the lateral surfaces.

15. A method for producing an optoelectronic semiconductor chip, the method comprising:

arranging a metallic mirror layer on a top side of a semiconductor layer sequence;

forming openings in the mirror layer toward the semiconductor layer sequence;

partially removing the semiconductor layer sequence in regions of the openings of the mirror layer, wherein an active region in the semiconductor layer sequence is penetrated and lateral surfaces of the active region are exposed; and

after exposing the lateral surfaces of the active region, arranging in a self-aligning manner a protection layer on the exposed lateral surfaces of the active region,

wherein forming the openings in the mirror layer is performed in a different step than partially removing the semiconductors layer sequence in the regions of the openings of the mirror layer.