IP Library Granted Patent US 9,192,946
Granted Patent B2
US 9,192,946 · App. 14/429,005 · Granted Nov 24, 2015

Hydroclone

Inventors: Santhosh K. Ramalingam (Pearland, TX); Christopher J. Siler (Hemlock, MI); Steven D. Jons (Eden Prairie, MN)
Assignee: Dow Global Technologies LLC
B04C9/00B01D21/0012B01D21/0042B01D21/2488B01D21/267B04C3/00B04C3/06B04C2009/004
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Quick Facts
Patent No.
US 9,192,946
App. No.
14/429,005
Granted
Nov 24, 2015
Kind
B2
Abstract

A hydroclone including: a vortex chamber ( 24 ) in fluid communication with the inlet ( 14 ), a process fluid chamber ( 32 ) in fluid communication with the process fluid outlet ( 20 ), an effluent separation chamber ( 30 ) located between the vortex chamber ( 24 ) and process fluid chamber ( 32 ) and including an outer circumferential surface ( 23 ), a vortex flow barrier ( 34 ) located between the vortex chamber ( 24 ) and the effluent separation chamber ( 30 ), an effluent barrier ( 36 ) located between the effluent separation chamber ( 30 ) and the process fluid chamber ( 32 ) including at least one opening ( 42 ′) near the outer circumferential surface ( 23 ), and an effluent opening ( 38 ) centrally located within the effluent separation chamber ( 30 ) in fluid communication with the effluent outlet ( 18 ); wherein the effluent separation chamber ( 30 ) has a median distance ( 80 ) between the vortex flow barrier ( 34 ) and effluent barrier ( 36 ) which is adjustable.

Claims (17)

1. A hydroclone ( 10 ) comprising: a tank ( 12 ) comprising an inlet ( 14 ), an effluent outlet ( 18 ), a process fluid outlet ( 20 ) and an inner peripheral wall ( 22 ) enclosing:

a vortex chamber ( 24 ) in fluid communication with the inlet ( 14 ),

a process fluid chamber ( 32 ) in fluid communication with the process fluid outlet ( 20 ),

an effluent separation chamber ( 30 ) located between the vortex chamber ( 24 ) and process fluid chamber ( 32 ) and including an outer circumferential surface ( 23 ), a vortex flow barrier ( 34 ) located between the vortex chamber ( 24 ) and the effluent separation chamber ( 30 ), the vortex flow barrier ( 34 ) providing at least one opening ( 42 ) near the outer circumferential surface ( 23 ) of the of the effluent separation chamber ( 30 ) which is adapted to allow liquid from the vortex chamber ( 24 ) to pass into the effluent separation chamber ( 30 ) near the outer circumferential surface ( 23 );

an effluent barrier ( 36 ) located between the effluent separation chamber ( 30 ) and the process fluid chamber ( 32 ) including at least one opening ( 42 ′) near the outer circumferential surface ( 23 ) which is adapted to allow liquid from the effluent separation chamber ( 30 ) to pass into the process fluid chamber ( 32 ) near the outer circumferential surface ( 23 );

an effluent opening ( 38 ) centrally located within the effluent separation chamber ( 30 ) in fluid communication with the effluent outlet ( 18 );

wherein the effluent separation chamber ( 30 ) has a median distance ( 80 ) between the vortex flow barrier ( 34 ) and effluent barrier ( 36 ) which is adjustable; and

a filter assembly ( 26 ) located within the vortex chamber ( 24 ) and enclosing a filtrate chamber ( 66 ) in fluid communication with a filtered fluid outlet ( 16 ) such that liquid passing through the filter assembly ( 26 ) enters the filtrate chamber ( 66 ) and exits the tank ( 12 ) by way of the filtered fluid outlet ( 16 ).

2. The hydroclone ( 10 ) of claim 1 wherein the effluent separation chamber ( 30 ) has a median diameter ( 82 ) and wherein the ratio of the median distance ( 80 ) to the median diameter ( 82 ) is between 0.1 and 0.8.

3. The hydroclone ( 10 ) of claim 1 wherein the effluent separation chamber ( 30 ) has a median diameter ( 82 ) and the ratio of the median distance ( 80 ) to the median diameter ( 82 ) is between 0.3 and 0.5.

4. The hydroclone ( 10 ) of claim 1 further comprising a sensor ( 84 ) adapted to detect changes in the nature of the liquid passing through the hydroclone ( 10 ).

5. A hydroclone system comprising:

i) the hydroclone of claim 1 including a fluid treatment pathway ( 28 ) that extends from the tank inlet ( 14 ) and successively through the vortex chamber ( 24 ), effluent separation chamber ( 30 ) and process fluid chamber ( 32 ) and exits the tank ( 12 ) by way of the process fluid outlet ( 18 );

ii) a recirculation loop (A) comprising the fluid treatment pathway ( 28 ) and extending from the process fluid outlet ( 18 ) to the inlet ( 14 ); and

iii) a recirculation pump (Z) located within the recirculation loop (A) that is adapted for moving liquid through the recirculation loop (A).

6. The hydroclone system of claim 5 further comprising a feed pump (Y) located outside of the recirculation loop (A) and adapted to introduce feed liquid into the recirculation loop (A).

7. The hydroclone system of claim 5 wherein the recirculation pump (Z) is adapted to drive at least twice the volume of liquid through the recirculation loop (A) as introduced by the feed pump (Y), and wherein the feed pump (Y) is adapted to provide a greater pressure increase than provided by the recirculation pump (Z).

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 4, 2021
From: DOW GLOBAL TECHNOLOGIES LLC
To: THE DOW CHEMICAL COMPANY
Reel/Frame 056478/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 4, 2021
From: THE DOW CHEMICAL COMPANY
To: DDP SPECIALTY ELECTRONIC MATERIALS US, INC.
Reel/Frame 056478/0527 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 28, 2021
From: DDP SPECIALTY ELECTRONIC MATERIALS US, LLC
To: ACCELERATED FILTRATION, INC.
Reel/Frame 056077/0476 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2015
From: RAMALINGAM, SANTHOSH K.; SILER, CHRISTOPHER J.; JONS, STEVEN D.
To: DOW GLOBAL TECHNOLOGIES LLC
Reel/Frame 036831/0247 →
Continuity (2)
Provisional Application 61718751 · Oct 26, 2012
Related Publication 20150224517A1 · Aug 13, 2015