Polymerizable composition for stereolithography
Provided is a highly versatile polymerizable composition that allows the fabrication equipment to be washed easily with water, allows the fabricated object to be removed easily from the support, and allows easy curing by application of light rays of 400 nm or higher, in optical 3D fabrication by lamination fabrication. A photopolymerizable composition for stereolithography containing a water-soluble radical polymerizable compound (A) represented by formula (1), a photopolymerization initiator (B) that generates radicals upon application of light rays of a wavelength of 400 nm or higher, and an ionic surfactant (C). In formula (1), R 1 is an organic group of valence a, a is an integer of 2 or higher, and R 2 is hydrogen or an alkyl having 1-6 carbon atoms.
1. A photopolymerizable composition for stereolithography, containing water-soluble radically polymerizable compound (A) represented by formula (1), photopolymerization initiator (B) that generates radicals by irradiation with light rays having a wavelength of 400 nanometers or more, and ionic surfactant (C):
wherein, in formula (1), R 1 is an a-valent organic group, a is an integer of 2 or more, and R 2 is hydrogen or alkyl having 1 to 6 carbons, and
the photopolymerizable composition can be washed out with water, but a fabricated object obtained from the photopolymerizable composition has water resistance.
2. The photopolymerizable composition according to claim 1 , wherein R 1 of radically polymerizable compound (A) includes a compound having structure represented by formula (2):
wherein, in formula (2), R 3 is alkylene having 2 to 5 carbons, and b is an integer of 1 or more.
3. The photopolymerizable composition according to claim 1 , wherein photopolymerization initiator (B) is one or more selected from the group of an α-aminoalkylphenon-based compound and an acylphosphine oxide-based compound.
4. The photopolymerizable composition according to claim 1 , wherein photopolymerization initiator (B) is one or more selected from an acylphosphine oxide-based compound.
5. The photopolymerizable composition according to claim 1 , wherein ionic surfactant (C) is one or more selected from the group of alkylbenzene sulfonate and polyoxyethylene alkyl ether sulfuric ester salt.
6. The photopolymerizable composition according to claim 1 , wherein ionic surfactant (C) is alkylbenzene sulfonate.
7. The photopolymerizable composition according to claim 1 , further containing water-soluble radically polymerizable compound (D) having structure represented by formula (3), (4) or (5):
wherein, in formula (3), R 4 is a divalent organic group, and R 5 is hydrogen or alkyl having 1 to 6 carbons:
wherein, in formula (4), R 6 is hydrogen or a monovalent organic group, R 7 is a monovalent organic group, and R 8 is hydrogen or alkyl having 1 to 6 carbons:
wherein, in formula (5), R 9 is a divalent organic group, and R 10 is hydrogen or alkyl having 1 to 6 carbons.
8. A photofabricated object obtained by curing the photopolymerizable composition according to claim 1 .