Light-emitting device
A light-emitting device and a lighting system includes a first conductivity type semiconductor layer, a gallium nitride-based super lattice layer on the first conductivity type semiconductor layer, an active layer, on the gallium nitride-based super lattice layer, a second conductivity type gallium nitride-based layer on the active layer, and a second conductivity type semiconductor layer, on the second conductivity type gallium nitride-based layer. The second conductivity type gallium nitride-based layer can include a second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N, such as Al x Ga (1−x) N/Al y Ga (1−y) N, on the active layer.
1. A light-emitting device comprising:
a first conductivity type semiconductor layer;
a gallium nitride-based superlattice layer on the first conductivity type semiconductor layer;
an active layer on the gallium nitride-based superlattice layer;
a second conductivity type gallium nitride-based layer on the active layer; and
a second conductivity type semiconductor layer on the second conductivity type gallium nitride-based layer,
wherein the second conductivity type gallium nitride-based layer comprises:
a second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer (where, 0<x<1, 0<y<1) on the active layer,
wherein a concentration (x) of Al in Al x Ga (1−x) N is higher than a concentration (y) of Al in Al y Ga (1−y) N in the second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer,
wherein the second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer has a plurality of cycles,
wherein the gallium nitride-based superlattice layer has a bandgap energy level which varies from the first conductivity type semiconductor layer toward the active layer, and
wherein the gallium nitride-based superlattice layer comprises:
a first-group gallium nitride-based superlattice layer having a first bandgap energy; and
a second-group gallium nitride-based superlattice layer having a second bandgap energy lower than the first bandgap energy on the first-group gallium nitride-based superlattice layer; and
a third-group gallium nitride-based superlattice layer having a third bandgap energy on a second-group gallium nitride-based superlattice layer,
wherein the second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer comprises a first second conductivity type Al x1 Ga (1−x1) N/Al y Ga (1−y) N superlattice layer, a second conductivity type Al x2 Ga (1−x2) N/Al y Ga (1−y) N superlattice layer, a third second conductivity type Al x3 Ga (1−x3) N/Al y Ga (1−y) N superlattice layer, and a fourth second conductivity type Al x4 Ga (1−x4) N/Al y Ga (1−y) N superlattice layer that are sequentially laminated,
wherein a concentration (x1) of Al in Al x1 Ga (1−x1) N of the first second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer, a concentration (x2) of Al in Al x2 Ga (1−x2) N of the second conductivity type Al x2 Ga (1−x2) N/Al y Ga (1−y) N superlattice layer, a concentration (x3) of Al in Al x3 Ga (1−x3) N of the third second conductivity type Al x3 Ga (1−x3) N/Al y Ga (1−y) N superlattice layer, and a concentration (x4) of Al in Al x4 Ga (1−x4) N of the fourth second conductivity type Al x4 Ga (1−x4) N/Al y Ga (1−y) N superlattice layer are different, and
wherein the first-group gallium nitride-based superlattice layer has a thickness less than a thickness of the second-group gallium nitride-based superlattice layer.
2. The light-emitting device of claim 1 , wherein the concentration (x) of the Al in the Al x Ga (1−x) N is varies from the active layer toward the second conductivity type semiconductor layer, and the concentration (y) of the Al in the Al y Ga (1−y) N is constant.
3. The light-emitting device of claim 1 , wherein the concentration (x1) of Al in Al x1 Ga (1−x1) N of the first second conductivity type Al x1 Ga (1−x1) N/Al y Ga (1−y) N superlattice layer is lower than the concentration (x2) of Al in Al x2 Ga (1−x2) N of the second conductivity type Al x2 Ga (1−x2) N/Al y Ga (1−y) N superlattice layer, and
wherein the concentration (x4) of Al in Al x4 Ga (1−x4) N of the fourth second conductivity type Al x4 Ga (1−x4 )N/Al y Ga (1−y) N superlattice layer is lower than the concentration (x3) of Al in Al x3 Ga (1−x3) N of the third second conductivity type Al x3 Ga (1−x3) N/Al y Ga (1−y) N superlattice layer.
4. The light-emitting device of claim 1 , wherein the second conductivity type gallium nitride-based layer comprises:
a second conductivity type In x Al y Ga (1−x−y) N layer (where, 0<x<1, 0<y<1) ( 127 ) having a second concentration of second conductivity type impurities on the active layer;
a second conductivity type GaN layer having a first concentration of second conductivity type impurities on the second conductivity type In x Al y Ga (1−x−y) N layer having the second concentration; and
the second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer on the second conductivity type GaN layer having the first concentration.
5. The light-emitting device of claim 4 , wherein the second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer is a second conductivity type Al x Ga (1−x) N/Al y Ga (1−y) N superlattice layer having a third concentration of second conductivity type impurities, and the first concentration is higher than the second concentration and the third concentration.
6. The light-emitting device of claim 1 , wherein the concentration (x) of the Al in the Al x Ga (1−x) N and the concentration (y) of the Al in the Al y Ga (1−y) N are constant.