Ink
The invention relates to an ink composition suitable for applications onto solar cells. Specifically, the invention describes several compositions, using nickel/silicon alloys which have been found to be particularly effective contact metallization of emitter layers. The ratio of nickel to silicon in claimed invention is in the range of 0.1:1 to 1:0.1.
1. A process for the formation of fine particles, the process comprising:
introducing Ni x Si y where x and y are in the range of 0.1 to 1, independently, Ni, and/or Si into a plasma stream to vaporize some or all of the Ni x Si y , Ni, and/or Si;
cooling to create fine particles selected from fine particles of the formula Ni x Si y where x and y are in the range of 0.1 to 1, independently; nickel and silicon composite fine particles; composite particles comprising one or more fine particles of the formula Ni x Si y where x and y are in the range of 0.1 to 1, independently; or combinations thereof; and
stabilizing the fine particles downstream of a region where the fine particles are formed using a method selected from coating the fine particles in tetrahydrofurfuryl alcohol and/or diethylene glycol butyl ether and/or dispersing the fine particles in solvent comprising tetrahydrofurfuryl alcohol and/or diethylene glycol butyl ether.
2. The process of claim 1 , wherein the fine particles of the formula Ni x Si y comprises Ni x Si y where x is 1 and y is 1.
3. The process of claim 1 , wherein the fine particles comprise nickel fine particles and silicon fine particles.
4. The process of claim 3 , wherein a ratio of nickel to silicon is in the range of 0.8:1 to 1.2:1.
5. The process of claim 1 , comprising combining the stabilized fine particles with a dopant, wherein the dopant comprises phosphorous, arsenic, or boron.
6. The process of claim 1 , comprising combining the stabilized fine particles with fine particles of a conducting metal.
7. The process of claim 1 , comprising combining the stabilized fine particles with a diffusion enhancer, wherein the diffusion enhancer comprises a nano-metal oxide.
8. The process of claim 7 , wherein the metal oxide is selected from: nickel, zinc, lead, bismuth, cerium, gallium, tin, indium, vanadium, tellurium, barium oxides, and combinations thereof.