IP Library Granted Patent US 11,577,969
Granted Patent B2
US 11,577,969 · App. 14/441,580 · Granted Feb 14, 2023

Transition metal precursor having low tap density and lithium transition metal oxide having high particle strength

Inventors: Jinhyung Lim (Daejeon, KR); Sung-Kyun Chang (Daejeon, KR); Won Seok Chang (Daejeon, KR); Sin Young Park (Daejeon, KR); Ho Suk Shin (Daejeon, KR); Hyun Jin Oh (Daejeon, KR); Jung Min Han (Daejeon, KR); In Sung Uhm (Daejeon, KR); Wang Mo Jung (Daejeon, KR); Dong Hun Lee (Daejeon, KR)
C01G53/04C01G53/006C01G53/50H01M4/505H01M4/525H01M10/052H01M10/0525C01P2002/50C01P2002/52C01P2004/61C01P2006/11H01M2004/028Y02T10/70
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Quick Facts
Patent No.
US 11,577,969
App. No.
14/441,580
Granted
Feb 14, 2023
Kind
B2
Abstract

Disclosed are a transition metal precursor for preparation of a lithium transition metal oxide, in which a ratio of tap density of the precursor to average particle diameter D50 of the precursor satisfies the condition represented by Equation 1 below, and a lithium transition metal oxide prepared using the same. 0 < Tap ⁢ density Average ⁢ particle ⁢ diameter ⁢ D ⁢ 50 of ⁢ transition ⁢ of ⁢ metal ⁢ precursor < 3500 ⁢ ( g / cc · cm ) ( 1 )

Claims (44)

1. A transition metal precursor for preparation of a lithium transition metal oxide,

wherein precursor particles constituting the transition metal precursor are transition metal hydroxide particles,

wherein the transition metal hydroxide particles are a compound represented by Formula 2 below:

M(OH 1-x ) 2   (2)

wherein M consists of nickel (Ni), cobalt (Co), and manganese (Mn); and 0≤x≤0.5; and

wherein a tap density of the transition metal precursor is from 1.3 g/cc to 1.6 g/cc, and a ratio of tap density to average particle diameter D50 of the precursor satisfies a condition represented by Equation 1 below:

2000

<

Tap

density

Average

particle

diameter

D

50

of

transition

of

metal

precursor

<

3500

(

g

/

cc

·

cm

)

.

(

1

)

2. The transition metal precursor according to claim 1 , wherein the transition metal precursor has an average particle diameter D50 of 1 to 30 μm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 4, 2021
From: LG CHEM, LTD.
To: LG ENERGY SOLUTION, LTD.
Reel/Frame 058295/0068 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 24, 2017
From: LIM, JINHYUNG; CHANG, SUNG-KYUN; CHANG, WON SEOK; PARK, SIN YOUNG; SHIN, HO SUK; OH, HYUN JIN; HAN, JUNG MIN; UHM, IN SUNG; JUNG, WANG MO; LEE, DONG HUN
To: LG CHEM, LTD.
Reel/Frame 041064/0396 →