Sputtering target with optimized performance characteristics

1. A sputtering target comprising a sputtering material comprising a metal oxide, wherein the metal oxide comprises zirconium and titanium as a metal fraction, and contains at least 30 wt % of at least one mixed oxide phase, and wherein a fraction of zirconium in the metal fraction is 20 to 30 wt %.

2. The sputtering target according to claim 1 , wherein the fraction of the mixed oxide phase in the sputtering material is at least 95 wt.-%, based on the total weight of the sputtering material.

3. The sputtering target according to claim 1 , wherein the metal oxide comprises zirconium dioxide phases, and wherein a fraction of the zirconium dioxide phases is at most 5 wt.-%, based on the total weight of the sputtering material.

4. The sputtering target according to claim 1 , wherein the sputtering material has an oxygen deficit relative to a stoichiometric composition.

5. The sputtering target of claim 1 , wherein the sputtering material contains at least 50 wt % of the at least one mixed oxide phase.

6. The sputtering target of claim 1 , wherein the sputtering material contains at least 70 wt % of the at least one mixed oxide phase.

7. The sputtering target of claim 1 , wherein the metal fraction further comprises yttrium, calcium, or hafnium.

8. The sputtering target of claim 1 , wherein the sputtering target comprises a stainless steel tube and a layer of the sputtering material thereon.

9. A sputtering target comprising:

a support structure; and

a sputtering material deposited on the support structure;

wherein the sputtering material comprises a metal oxide and at least 95 wt % of at least one mixed oxide phase;

wherein the metal oxide comprises zirconium and titanium, and a fraction of zirconium in the metal oxide is 20 to 30 wt %.