Method of manufacturing independent depth-controlled shallow trench isolation
A method of manufacturing a semiconductor structure. A patterned first hard mask is formed on a substrate. The patterned first hard mask includes first trench patterns extending along a first direction. A second hard mask is then formed on the patterned first hard mask. A patterned photoresist layer is formed on the second hard mask. The patterned photoresist layer includes second trench patterns extending along a second direction. The second trench patterns intersect first trench patterns. Using the patterned photoresist layer as an etch mask, a first etch process is performed to transfer the second trench patterns into the patterned first hard mask and the second hard mask. Subsequently, using the patterned first hard mask as an etch mask, a second etch process is performed to transfer the first trench patterns and the second trench patterns into the substrate.
1. A method of manufacturing a semiconductor structure, comprising:
providing a substrate having thereon a pad layer;
forming a patterned first hard mask on the pad layer, wherein said patterned first hard mask includes a plurality of first trench patterns extending along a first direction, wherein portions of the pad layer are exposed by the plurality of first trench patterns;
forming a second hard mask on said substrate and said patterned first hard mask;
forming a patterned photoresist layer on said second hard mask, wherein said patterned photoresist layer includes a plurality of second trench patterns extending along a second direction, and said plurality of second trench patterns partially overlap said plurality of first trench patterns;
using said patterned photoresist layer as an etch mask to perform a first etch process, thereby transferring said plurality of second trench patterns into said patterned first hard mask and said second hard mask, wherein said portions of the pad layer exposed by the plurality of first trench patterns are completely removed; and
using said patterned first hard mask as an etch mask to perform a second etch process, thereby transferring said first trench patterns and said second trench patterns into said substrate, so as to form a plurality of first trench isolation structures extending along the first direction having a first depth and a plurality of second trench isolation structures extending along the second direction having a second depth and a third depth in the substrate, wherein the third depth is deeper than the second depth, wherein each said first trench isolation structure intersects each said second trench isolation structure within the substrate to thereby form an rhomboid-shaped overlapping region having the third depth.
2. The method of manufacturing a semiconductor structure according to claim 1 wherein the patterned first hard mask comprises silicon oxide.
3. The method of manufacturing a semiconductor structure according to claim 2 wherein the patterned first hard mask is formed on a silicon nitride pad layer.
4. The method of manufacturing a semiconductor structure according to claim 1 wherein the second hard mask is in direct contact with said patterned first hard mask.
5. The method of manufacturing a semiconductor structure according to claim 1 wherein the second hard mask comprises a carbon-containing material.
6. The method of manufacturing a semiconductor structure according to claim 1 wherein the second hard mask has a thickness ranging between 1000 angstroms and 4000 angstroms.
7. The method of manufacturing a semiconductor structure according to claim 1 wherein the second trench patterns intersect said plurality of first trench patterns from a top view.
8. The method of manufacturing a semiconductor structure according to claim 1 wherein the first direction is not perpendicular to said second direction.
9. The method of manufacturing a semiconductor structure according to claim 1 wherein the pad layer is a silicon nitride pad layer.