IP Library Granted Patent US 9,363,610
Granted Patent B2
US 9,363,610 · App. 14/452,067 · Granted Jun 7, 2016

MEMS process and device

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Quick Facts
Patent No.
US 9,363,610
App. No.
14/452,067
Granted
Jun 7, 2016
Kind
B2
Abstract

A method of fabricating a micro-electrical-mechanical system (MEMS) transducer comprises the steps of forming a membrane on a substrate, and forming a back-volume in the substrate. The step of forming a back-volume in the substrate comprises the steps of forming a first back-volume portion and a second back-volume portion, the first back-volume portion being separated from the second back-volume portion by a step in a sidewall of the back-volume. The cross-sectional area of the second back-volume portion can be made greater than the cross-sectional area of the membrane, thereby enabling the back-volume to be increased without being constrained by the cross-sectional area of the membrane. The back-volume may comprise a third back-volume portion. The third back-volume portion enables the effective diameter of the membrane to be formed more accurately.

Claims (16)

1. A micro-electrical-mechanical system (MEMS) capacitive microphone comprising:

a semiconductor substrate comprising electronic circuitry;

a membrane formed relative to a first side of the semiconductor substrate; and

a back-volume formed in the semiconductor substrate relative to a second side of the semiconductor substrate; and

wherein the back-volume is formed in the semiconductor substrate such that the back-volume lies at least partially under an area of the semiconductor substrate comprising electronic circuitry.

2. A MEMS capacitive microphone as claimed in claim 1 , wherein the back-volume is formed such that the back-volume extends through the semiconductor substrate, between the membrane and the second side to form an opening, and also extends into the semiconductor substrate.

3. A MEMS capacitive microphone as claimed in claim 2 , wherein the back-volume extends into the semiconductor substrate in a direction substantially orthogonal to an axis of the opening.

4. A MEMS capacitive microphone as claimed in claim 1 , wherein the back-volume comprises:

a first back-volume portion and a second back-volume portion having a boundary therebetween defined by a discontinuity in a sidewall of the substrate; and

wherein the cross sectional area of the second back-volume portion is greater than the cross sectional area of the first back-volume portion.

5. A micro-electrical-mechanical system (MEMS) capacitive microphone comprising:

a substrate;

a membrane formed relative to a first side of the substrate; and

a back-volume formed in the substrate relative to a second side of the substrate;

wherein the back-volume comprises at least a first back-volume portion, a second back-volume portion and a third back-volume portion, each having a boundary therebetween defined by a discontinuity in a sidewall of the substrate.

6. A MEMS capacitive microphone as claimed in claim 5 , wherein the cross sectional area of the second back-volume portion is greater than the cross sectional area of the first back-volume portion.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 10, 2016
From: CIRRUS LOGIC INTERNATIONAL SEMICONDUCTOR LTD.
To: CIRRUS LOGIC, INC.
Reel/Frame 038534/0974 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 2, 2015
From: CIRRUS LOGIC INTERNATIONAL (UK) LTD.
To: CIRRUS LOGIC INTERNATIONAL SEMICONDUCTOR LTD.
Reel/Frame 035806/0389 →
CHANGE OF NAME Recorded Apr 1, 2015
From: WOLFSON MICROELECTRONICS PLC
To: WOLFSON MICROELECTRONICS LTD
Reel/Frame 035353/0409 →
CHANGE OF NAME Recorded Apr 1, 2015
From: WOLFSON MICROELECTRONICS LTD
To: CIRRUS LOGIC INTERNATIONAL (UK) LTD.
Reel/Frame 035353/0413 →