Sensing
An apparatus including a first sensor including a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter. The sensitivity of the first sensor to one of the first and the second parameters may be controlled by maintaining, as a constant, the other of the first and the second parameters. The apparatus may include a second sensor sensitive to at least one of the first parameter and the second parameter. The first parameter may be deformation and the second parameter may be a concentration of a gaseous analyte such as, for example, humidity. The second sensor may include the sensing material that is sensitive to the first parameter and the second parameter.
1 . An apparatus comprising:
a first sensor comprising a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter, wherein the first parameter is deformation and the second parameter is concentration of a gaseous analyte; and
a second sensor sensitive to at least one of the first parameter and the second parameter.
2 . An apparatus as claimed in claim 1 , wherein the second parameter is humidity.
3 . An apparatus as claimed in claim 1 , wherein the second sensor comprises the sensing material that is sensitive to the first parameter and the second parameter.
4 . An apparatus comprising:
a first sensor comprising a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter;
a second sensor comprising the sensing material that is sensitive to the first parameter and the second parameter,
wherein a sensitivity of the first sensor to the first parameter is different to a sensitivity of the second sensor to the first parameter.
5 . An apparatus as claimed in claim 4 , wherein the first parameter is deformation and the second parameter is concentration of a gaseous analyte.
6 . An apparatus as claimed in claim 4 , wherein the first parameter is humidity.
7 . An apparatus as claimed in claim 1 , wherein the sensing material is selected from the group comprising: graphene oxide, graphene, functionalised graphene, boron nitride, transition metal dichalcogenides.
8 . An apparatus as claimed in claim 1 , wherein the sensing material comprises a stack of two-dimensional layers of the same material.
9 . (canceled)
10 . An apparatus as claimed in claim 1 , wherein, for a range of values of the second parameter, a sensitivity of the first sensor to the first parameter is different to a sensitivity of the second sensor to the first parameter and wherein, for a range of values of the first parameter, a sensitivity of the first sensor to the second parameter is different to a sensitivity of the second sensor to the second parameter.
11 . (canceled)
12 . (canceled)
13 . (canceled)
14 . (canceled)
15 . (canceled)
16 . (canceled)
17 . (canceled)
18 . (canceled)
19 . (canceled)
20 . An apparatus as claimed in claim 1 , wherein a sensitivity of the first and/or second sensor is selectively controlled by: selectively suppressing sensitivity to deformation but not gaseous analyte ingress by using a physically attached coating that is permeable; or
selectively suppressing sensitivity to gaseous analyte ingress but not deformation by using an unattached impermeable coating; or
maintaining a constant gaseous analyte concentration using a seal; or
maintaining a constant deformation.
21 . (canceled)
22 . (canceled)
23 . (canceled)
24 . An apparatus as claimed in claim 1 , wherein a sensitivity of the first and/or second sensor is differentially controlled by using a different thickness of sensing material in the first and second sensors or using different sensing material in the first and second sensors.
25 . (canceled)
26 . An apparatus as claimed in claim 1 , wherein the sensing material in the first and second sensors both comprises graphene oxide but the material of one of the first and second sensors comprises one or more functional groups absent from the material of the other one of the first and second sensors.
27 . An apparatus as claimed in claim 1 , comprising a flexible substrate.
28 . An apparatus as claimed in claim 1 , comprising temperature compensation circuitry.
29 . (canceled)
30 . A method comprising:
processing an output from a first sensor comprising a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter, wherein the first parameter is deformation and the second parameter is concentration of a gaseous analyte; and
processing an output from a second sensor sensitive to at least one of the first parameter and the second parameter.
31 . A method as claimed in claim 30 , wherein the second sensor comprises the sensing material that is sensitive to the first parameter and the second parameter.
32 . A method comprising:
processing output from a first sensor comprising a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter;
processing output from a second sensor comprising the sensing material that is sensitive to the first parameter and the second parameter,
wherein a sensitivity of the first sensor to the first parameter is different to a sensitivity of the second sensor to the first parameter.
33 . A method as claimed in claim 32 , wherein the first parameter is deformation and the second parameter is concentration of a gaseous analyte.
34 . A method as claimed in claim 30 , comprising: processing the output from the first sensor and the output from the second sensor to determine a value for the first parameter and a value for the second parameter.
35 . (canceled)
36 . (canceled)
37 . (canceled)
38 . An apparatus comprising:
a first sensor comprising a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter; and
wherein a sensitivity of the first sensor to one of the first and the second parameter is controlled by maintaining, as a constant, the other of the first and the second parameters.
39 . An apparatus as claimed in claim 38 , wherein the other of the first and second parameters is maintained by:
providing additional structure to the sensor; or
providing additional structure to block changes associated with the other of the first and second parameters; or
using a physically attached coating that is permeable; or
using an unattached impermeable coating; or
using a seal to maintain a constant gaseous analyte concentration; or
locking a constant deformation.
40 . (canceled)
41 . (canceled)
42 . (canceled)
43 . (canceled)
44 . (canceled)
45 . An apparatus as claimed in claim 38 , comprising a second sensor comprising the sensing material that is sensitive to the first parameter and the second parameter.
46 . A method comprising:
processing an output from a first sensor comprising a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter; wherein a sensitivity of the first sensor to one of the first and the second parameter is controlled by maintaining, as a constant, the other of the first and the second parameters.