IP Library Granted Patent US 10,160,014
Granted Patent B2
US 10,160,014 · App. 14/479,736 · Granted Dec 25, 2018

Chuck cleaner and cleaning method

Inventors: Yoshihito Kobayashi (Tokyo, JP); Masamitsu Ito (Kanagawa, JP)
Assignee: Toshiba Memory Corporation
B08B7/0028G03F7/707G03F7/70925H01L21/67028H01L21/67132H01L21/6875
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,160,014
App. No.
14/479,736
Granted
Dec 25, 2018
Kind
B2
Abstract

According to one embodiment, a chuck cleaner includes a support, an adhesive layer, and a support substrate. The support includes a first portion, a second portion, and a third portion provided between the first portion and the second portion. The support substrate is provided between the support and the adhesive layer. The support substrate includes a first region fixed to the first portion, a second region fixed to the second portion, a third region provided between the first region and the second region and having variable distance from the third portion, a fourth region provided between the first region and the third region and separated from the support, and a fifth region provided between the second region and the third region and separated from the support.

Claims (44)

1. A chuck cleaner comprising:

a support, the support including

first and second raised portions disposed at opposed perimeter portions thereof,

a plurality of-third raised portions, and

a plurality of recessed portions defined between respective adjacent third raised portions as well as between the first and the second raised portions and the third raised portions;

an adhesive layer; and

a support substrate provided between the support and the adhesive layer, peripheral portions of the support substrate being fixed to the first and second raised portions of the support, a bottom surface of an inner region of the support substrate being adapted to engage an upper surface of each of the third plurality of raised portions in a first orientation and be spaced from the upper surface of each of the third plurality of raised portions in a second orientation,

wherein

the adhesive layer is brought in contact with a foreign matter adhering to a chuck part, the adhesive layer is separated from the chuck part to move the foreign matter from the chuck part to the adhesive layer.

2. The cleaner according to claim 1 , wherein

the support substrate includes a first region fixed to the first raised portion, a second region fixed to the second raised portion, and a third region having variable distance from the third raised portions; and

a first distance between the third region and the third raised portions in a state where the adhesive layer is separated from the chuck part is longer than the first distance in a state where the adhesive layer and the chuck part are in contact with each other.

3. The cleaner according to claim 2 , wherein

the third raised portions have third ends contacting the third region, and

a position of the third ends in a first direction toward the first region from the first raised portion is variable.

4. The cleaner according to claim 1 , wherein

the support substrate includes a first region fixed to the first raised portion, a second region fixed to the second raised portion, and a third region having variable distance from the third raised portions;

the first raised portion has a first end contacting the first region,

the second raised portion has a second end contacting the second region,

the third raised portions has a third end contacting the third region,

a position in a first direction toward the first region from the first raised portion, of the third end is disposed between a position in the first direction of the first end and a position in the first direction of the adhesive layer, and

the position in the first direction of the third end is disposed between a position in the first direction of the second end and the position in the first direction of the adhesive layer.

5. The cleaner according to claim 1 , wherein

the support substrate includes a first region fixed to the first raised portion, a second region fixed to the second raised portion, and a third region having variable distance from the third raised portions;

the third raised portions have third ends contacting the third region, and a position of the third ends in a first direction toward the first region from the first raised portion is variable.

6. The cleaner according to claim 1 , wherein

the chuck part is a reticle chuck of an exposure device.

7. The cleaner according to claim 1 , wherein a plurality of protrusions including the first portion, the second raised portion and the third raised portions are provided on the support.

8. The cleaner according to claim 7 , wherein each of the protrusions is provided at an equal spacing.

9. A chuck cleaner comprising:

a support including

first and second raised portions disposed at opposed perimeter portions thereof,

a plurality of third raised portions, and

a plurality of recessed portions defined between respective adjacent third raised portions as well as between the first and second raised portions and the third raised portions;

an adhesive layer; and

a support substrate provided between the support and the adhesive layer, the support substrate comprising:

a first region fixed to the first raised portion,

a second region fixed to the second raised portion,

a third region provided between the first region and the second region and having variable distance from the third raised portions,

a fourth region provided between the first region and the third region and separated from the support,

a fifth region provided between the second region and the third region and separated from the support,

a peripheral portion fixed to the first and second raised portions, and

a bottom surface of an inner region adapted to engage an upper surface of each of the third plurality of raised portions in a first orientation and be spaced from the upper surface of each of the third plurality of raised portions in a second orientation;

the adhesive layer being brought in contact with a foreign matter adhering to a chuck part, the adhesive layer being separated from the chuck part to move the foreign matter from the chuck part to the adhesive layer.

Assignments (6)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE POSTAL CODE PREVIOUSLY RECORDED ON REEL 042910 FRAME 0321. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Sep 1, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043747/0290 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 5, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 042910/0321 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 30, 2014
From: KOBAYASHI, YOSHIHITO; ITO, MASAMITSU
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 034066/0766 →
Priority Claims (1)
JP 2013-217732 · Oct 18, 2013 · national
Continuity (1)
Related Publication 20150107621A1 · Apr 23, 2015