Method for forming through-hole in insulating substrate by using laser beam
View Patent ↗A method including a) forming a through-hole in a dummy substrate including a surface by radiating a laser to the surface of the dummy substrate in a state where the dummy substrate is moved relative to the laser along a direction parallel to the surface of the dummy substrate, b) determining an angle α (−90°<α<+90°) of the through-hole relative to a line perpendicular to the surface of the dummy substrate, and c) forming a through-hole in the insulating substrate with the same conditions as step a) except for radiating a laser at an angle β relative to a line perpendicular to a surface of the insulating substrate. The angle β is set to be line symmetric with the angle α relative to the line perpendicular to the surface of the insulating substrate and satisfy a relationship of β=−α.
1. A method for forming a plurality of through-holes in an insulating substrate, the method comprising the steps of:
a) forming a through-hole in a dummy insulating substrate including a first surface by radiating a laser beam to the first surface of the dummy insulating substrate in a state where the dummy insulating substrate is moved relative to the laser beam along a direction parallel to the first surface of the dummy insulating substrate;
b) determining an inclination angle α (−90 °<α<+90°) of the through-hole relative to a line that is perpendicular to the first surface of the dummy insulating substrate; and
c) forming a through-hole in the insulating substrate with the same conditions as step a) except for radiating a laser beam at an angle β relative to a line that is perpendicular to a first surface of the insulating substrate, wherein the angle β is set to be line symmetric with the inclination angle α relative to the line perpendicular to the first surface of the insulating substrate and satisfy a relationship of β=−α.
2. The method as claimed in claim 1 , wherein the inclination angle α satisfies a relationship of |α|≦20°.
3. The method as claimed in claim 1 ,
wherein step a) includes radiating the laser beam in a direction substantially perpendicular to the first surface of the dummy insulating substrate.
4. The method as claimed in claim 1 ,
wherein the laser beam of step a) and the laser beam of step c) are radiated with substantially the same power,
wherein the dummy insulating substrate of step a) and the insulating substrate of step c) have substantially the same thickness, and
wherein the dummy insulating substrate of step a) and the insulating substrate of step c) are moved at substantially the same rate.
5. The method as claimed in claim 1 , further comprising a step of:
d) generating a direct current discharge by using a pair of electrodes provided on respective sides of the insulating substrate after performing step c).