Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation
View Patent ↗An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.
1. An optical instrument, comprising:
a chamber;
an object exposed to an interior of the chamber;
a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber;
a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion; and
an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object, whereby when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object.
2. The system of claim 1 , wherein the low-pressure gas is molecular Hydrogen gas at a pressure of 0.5-500 Pa, whereby when the EUV/VUV light source is activated, H 3 + , H 2 + , H + ions are formed and directed to the object.
3. The system of claim 1 , wherein the low-pressure gas is a noble gas at a pressure of 0.1-50 Pa, whereby when the EUV/VUV light source is activated, noble gas ions are formed and directed to the object.
4. The system of claim 1 , wherein the low-pressure gas is molecular Oxygen gas at a pressure of 0.1-50 Pa, whereby when the EUV/VUV light source is activated, Oxygen ions are formed and directed to the object.
5. The system of claim 1 , wherein the chamber is configured with one or more exit ports to cause the low-pressure gas to flow.
6. The system of claim 1 , wherein the object is an optical component.
7. The system of claim 6 , wherein the optical component comprises one of a mirror, a lens, a filter, a sensor, a mask.
8. The system of claim 1 , wherein the object comprises at least one of a portion of a wall of the chamber and an optical stage.
9. The system of claim 1 , wherein the remaining portion is maintained at ground.
10. The system of claim 1 , wherein the low voltage is a voltage having a magnitude equal to or less than 50 excluding zero volts.
11. The system of claim 1 , wherein the low voltage is a voltage having a magnitude equal to or less than 5-50 Volts.
12. The system of claim 1 , wherein the low voltage is a negative voltage.
13. The system of claim 1 , wherein the low voltage is a positive voltage.
14. The system of claim 1 , wherein the low voltage source is adapted to maintain the object at the low voltage over multiple periods of time using an AC signal.
15. The system of claim 1 , wherein the low voltage source is adapted to maintain the object at the low voltage only during periods of time when the EUV/VUV light source does not project light through the chamber.
16. The system of claim 1 , wherein the system is adapted to selectively direct the low-pressure gas onto a surface of the object.
17. The optical instrument of claim 1 , wherein the instrument is one of a mask inspection system, a lithographic system and a metrology system.
18. The optical instrument of claim 1 , wherein the ions comprise at least one of H 3 + , H 2 + , H + ions, Oxygen ions and noble gas ions.
19. A method of contamination protection for use in an optical instrument, comprising:
providing an object exposed to an interior of a chamber of the instrument;
providing low-pressure gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen gas, and a low-pressure noble gas in the chamber;
maintaining the object at a low voltage relative to a remaining portion of the instrument; and
projecting EUV/VUV light through the low pressure gas onto the object, whereby ions of the low-pressure gas are formed and directed to the object.
20. The method of claim 19 , wherein the method further comprises operating the instrument to one of (1) capture an image of an item in the chamber or (2) lithographically process a substrate in the chamber, while providing the low-pressure gas in the chamber.
21. The method of claim 19 , wherein the method further comprises operating the instrument to one of (1) capture an image of an item in the chamber or (2) to lithographically process a substrate in the chamber, while providing a second gas for normal operation or providing at least a near-vacuum condition in the chamber for normal operation, prior to the step of providing the low-pressure gas.
22. The method of claim 19 , further comprising projecting light that is outside of the EUV/VUV range through the low-pressure gas onto the object.
23. The method of claim 19 , wherein the step of providing low-pressure gas in the chamber comprises providing low-pressure, molecular Hydrogen gas at a pressure of 0.5-500 Pa.
24. The method of claim 19 , wherein the step of providing low-pressure gas in the chamber comprises providing molecular Oxygen gas at a pressure of 0.5-50 Pa.
25. The method of claim 19 , wherein the step of providing low-pressure gas in the chamber comprises providing a noble gas at a pressure of 0.5-50 Pa.
26. The method of claim 19 , further comprising flowing the low-pressure gas in the chamber.
27. The method of claim 19 , wherein the object is an optical component.
28. The method of claim 19 , wherein the object comprises at least one of a portion of a wall of the chamber and an optical stage.
29. The method of claim 19 , wherein the remaining portion is maintained at ground.
30. The method of claim 19 , wherein the step of maintaining the object at a low voltage comprises maintaining the object at a low voltage over multiple periods using an AC signal.
31. The method of claim 19 , wherein the step of maintaining the object at a low voltage comprises providing the low voltage only during periods of time when the EUV/VUV light source does not project light through the chamber.
32. The method of claim 19 , further comprising selectively directing the low-pressure gas onto a surface of the object.
33. The method of claim 19 , wherein the low voltage is a voltage having a magnitude equal to or less than 50 Volts excluding zero Volts.
34. The method of claim 19 , wherein the low voltage is a voltage having a magnitude equal to or less than 5-50 Volts.
35. The method of claim 19 , wherein the low voltage is a negative voltage.
36. The method of claim 19 , wherein the low voltage is a positive voltage.
37. The method of claim 19 , wherein the instrument is one of a mask inspection system, a lithographic system and a metrology system.
38. The method of claim 19 , wherein the ions comprise at least one of H 3 + , H 2 + , H + ions, Oxygen ions and noble gas ions.