Method for patterning flexible substrate
The invention provides a method for patterning a flexible substrate. The method for patterning a flexible substrate includes providing a carrier substrate. A release layer is formed on the carrier substrate. A flexible substrate film is formed on the release layer. A plurality of UV blocking mask patterns is formed covering various portions of the flexible substrate film and the release layer. A UV lighting process is performed to expose the flexible substrate film and the release layer not covered by the UV blocking mask patterns, to a UV light. A debonding step is performed so that the various portions of the flexible substrate film directly above the various portions of the release layer, which were not exposed to the UV light, are separated from the carrier substrate.
1. A method for patterning a flexible substrate, comprising:
providing a carrier substrate;
forming a release layer on the carrier substrate;
forming a flexible substrate film on the release layer;
forming a plurality of UV blocking mask patterns covering various portions of the flexible substrate film and the release layer;
performing a UV lighting process to expose the flexible substrate film and the release layer not covered by the UV blocking mask patterns, to a UV light; and
performing a debonding step so that the various portions of the flexible substrate film directly above the various portions of the release layer, which were not exposed to the UV light, are separated from the carrier substrate and the release layer.
2. The method for patterning a flexible substrate as claimed in claim 1 , further comprising:
performing a cutting process to cut the flexible substrate film, the release layer and the carrier substrate in sequence at where the flexible substrate film is exposed to the UV light; and
performing a separating step to allow air to enter into an interface between the release layer and the flexible substrate film covered by the UV blocking mask patterns before performing the debonding step.
3. The method for patterning a flexible substrate as claimed in claim 1 , wherein the release layer comprises the C—H functional group.
4. The method for patterning a flexible substrate as claimed in claim 3 , wherein the release layer comprises parylene group materials.
5. The method for patterning a flexible substrate as claimed in claim 4 , wherein the parylene group materials comprise identical recurring units of Formula 1, Formula 2 or Formula 3,
wherein n>20.
6. The method for patterning a flexible substrate as claimed in claim 1 , wherein the release layer, after being exposed to the UV light, comprises the C═O functional group or the —OH functional group.
7. The method for patterning a flexible substrate as claimed in claim 1 , further comprising:
removing the UV blocking mask patterns after performing the UV lighting process.