Semiconductor apparatus and manufacturing method of the same

1. A semiconductor apparatus, comprising:

a first pipe gate divided by an isolation layer;

a first pipe channel layer buried in the first pipe gate;

a second pipe gate covering the first pipe channel layer, the first pipe gate and the isolation layer, wherein the second pipe gate is in contact with the first pipe gate and the isolation layer; and

a second pipe channel layer buried in the second pipe gate.

2. The semiconductor apparatus of claim 1 , wherein an area of the second pipe gate is larger than that of the first pipe gate.

3. The semiconductor apparatus of claim 1 , wherein the first pipe channel layer and the second pipe channel layer may be configured in a matrix shape along a first direction and a second direction crossing the first direction.

4. The semiconductor apparatus of claim 3 , the first pipe channel layer and the second pipe channel layer are alternately arranged in the first direction.

5. The semiconductor apparatus of claim 3 , wherein the first pipe channel layer and the second pipe channel layer are alternately arranged in the second direction.

6. The semiconductor apparatus of claim 1 , wherein the second pipe channel layer is shorter than the first pipe channel layer.

7. The semiconductor apparatus of claim 1 , wherein the first pipe gate comprises:

a first conductive layer being shallower than the isolation layer to allow sidewalls on an upper portion of the isolation layer to protrude above the first conductive layer; and

a second conductive layer formed along the sidewalls of the isolation layer protruding above the first conductive layer and a top surface of the first conductive layer, wherein the second conductive layer includes a first trench filled with the first pipe channel layer.

8. The semiconductor apparatus of claim 7 , wherein the isolation layer comprises:

a first portion in contact with the first conductive layer; and

a second portion electrically coupled to the first portion in a narrower width than the first portion and in contact with the second conductive layer.

9. The semiconductor apparatus of claim 1 , wherein the second pipe gate comprises:

a third conductive layer including a second trench to be filled with the second pipe channel layer and covering the first pipe gate and the first pipe channel layer; and

a fourth conductive layer covering the second pipe channel layer and the third conductive layer.

10. The semiconductor apparatus of claim 1 , further comprising:

a first stacked body over the second pipe gate;

a second stacked body over the first stacked body with a greater height than the first stacked body;

an etch stop layer interposed between the first stacked body and the second stacked body; and

a slit dividing the second stacked body, the etch stop layer and the first stacked body into a source side stacked body and a drain side stacked body.

11. The semiconductor apparatus of claim 10 , wherein the first stacked body and the second stacked body comprise alternately stacked interlayer insulating layers and conductive layers.

12. The semiconductor apparatus of claim 10 , wherein the etch stop layer comprises an Al 2 O 3 or a poly silicon layer.

13. The semiconductor apparatus of claim 10 , further comprising:

a first source side channel layer passing through the source side stacked body and electrically coupled to the first pipe channel layer; and

a first drain side channel layer passing through the drain side stacked body and electrically coupled to the first pipe channel layer.

14. The semiconductor apparatus of claim 10 , further comprising:

a second source side channel layer passing through the source side stacked body and electrically coupled to the second pipe channel layer; and

a second drain side channel layer passing through the drain side stacked body and electrically coupled to the second pipe channel layer.