Method for fabricating a liquid crystal display device comprising an alignment film that includes a photolytic polymer and a non-photolytic polymer
View Patent ↗A method for fabricating a liquid crystal display device including a TFT substrate having an alignment film formed thereon, an opposing substrate, and a liquid crystal layer sandwiched therebetween. The alignment film on the TFT substrate includes a photolytic polymer made from a first precursor including cyclobutane, and a non-photolytic polymer made from a second precursor. The method includes the steps of depositing a mixture material including the first precursor and the second precursor in which the second precursor settles more on an upper surface of the TFT substrate than the first precursor, imidizing the mixture material, and irradiating the mixture material with ultraviolet light for photo-alignment, and after irradiating, heating the mixture material to form the alignment film.
1. A method for fabricating a liquid crystal display device including a TFT substrate in which an alignment film is formed over a pixel electrode and a common electrode;
an opposing substrate which faces the TFT substrate; and
a liquid crystal layer sandwiched between the TFT substrate and the opposing substrate;
wherein the alignment film on the TFT substrate includes a photolytic polymer made from a first precursor including cyclobutane, and a non-photolytic polymer made from a second precursor;
the method comprising the steps of:
depositing a mixture material including the first precursor and the second precursor in which the second precursor settles more on an upper surface of the TFT substrate than the first precursor;
imidizing the mixture material, and irradiating the mixture material with ultraviolet light for photo-alignment; and
after irradiating, heating the mixture material to form the alignment film.
2. The method for fabricating a liquid crystal display device according to claim 1 ,
wherein an irradiance level of the ultraviolet light is from 2000 to 5000 mJ/cm 2 , a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 230° C., and an interval after the ultraviolet light irradiation unit heating the TFT substrate and the opposing substrate is within one hour.
3. The method for fabricating a liquid crystal display device according to claim 1 ,
wherein an irradiance level of the ultraviolet light is from 1000 to 7000 mJ/cm 2 , a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 200° C., and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within 24 hours.
4. The method for fabricating a liquid crystal display device according to claim 1 ,
wherein an irradiance level of the ultraviolet light is from 500 to 8000 mJ/cm 2 , a temperature at which the TFT substrate and the opposing substrate are heated after the ultraviolet light irradiation is not less than 150° C., and an interval after the ultraviolet light irradiation until heating the TFT substrate and the opposing substrate is within 168 hours.
5. The method for fabricating a liquid crystal display device according to claim 1 , further comprising forming color filters on the opposing substrate.
6. The method for fabricating a liquid crystal display device according to claim 1 , wherein the second precursor is polyamide acid.
7. The method for fabricating a liquid crystal display device according to claim 6 , wherein the first precursor is polyamide acid ester.
8. The method for fabricating a liquid crystal display device according to claim 7 , wherein the second precursor does not include cyclobutane.
9. The method for fabricating a liquid crystal display device according to claim 6 , wherein the first precursor is polyamide acid ester.
10. The method for fabricating a liquid crystal display device according to claim 6 , wherein the alignment film is separated into two layers.