Process for group III-IV semiconductor nanostructure synthesis and compositions made using same
View Patent ↗Methods for producing nanostructures, particularly Group III-V semiconductor nanostructures, are provided. The methods include use of novel Group III and/or Group V precursors, novel surfactants, oxide acceptors, high temperature, and/or stable co-products. Related compositions are also described. Methods and compositions for producing Group III inorganic compounds that can be used as precursors for nanostructure synthesis are provided. Methods for increasing the yield of nanostructures from a synthesis reaction by removal of a vaporous by-product are also described.
1. A nanostructure, comprising:
a Group III-V semiconductor;
the nanostructure being substantially free of metallic noble, Group Ib, Group IIb, Group IIIb, and transition metal elements;
the nanostructure being a branched nanostructure or having an aspect ratio greater than about 1.2; and
the nanostructure having a wurtzite crystal structure or a zinc blende-wurtzite mixed crystal structure.
2. The nanostructure of claim 1 , wherein one or more nanostructures are nanocrystals, nanorods, or nanotetrapods.
3. The nanostructure of claim 1 , wherein the aspect ratio is greater than 1.5.
4. The nanostructure of claim 1 , wherein the nanostructures comprise an atom selected from the group consisting of N, P, As, Sb, and Bi.
5. The nanostructure of claim 1 , wherein the nanostructures comprise an atom selected from the group consisting of B, Al, Ga, In, and Ti.
6. The nanostructure of claim 1 , wherein the nanostructures are substantially free of Si, phosphonic acid, phosphinic acid, carboxylic acid, tri-n-alkyl phosphines, and/or tri-n-alkyl phosphine oxides.
7. The nanostructure of claim 1 , wherein a surface of the nanostructures is associated with a sulfonic acid, a boronic acid, or a deprotonated form or condensate thereof.
8. The nanostructure of claim 2 , wherein a surface of the nanostructures is associated with a carboxylic acid or a deprotonated form or condensate thereof, and/or a surfactant comprising of a Group V atom substituted with three unsaturated groups.
9. A nanostructure, comprising:
a Group III-V semiconductor;
the nanostructure being substantially free of metallic noble, Group Ib, Group IIb, Group IIIb, and transition metal elements;
the nanostructure being a tetrahedral nanostructure with all six edges having a length of at least 10 nm; and
the nanostructure being a nanocrystal or is a zinc blende-mixed crystal structure.
10. The nanostructure of claim 9 , wherein the nanostructures comprise an atom selected from the group consisting of N, P, As, Sb, and Bi.
11. The nanostructure of claim 9 , wherein the nanostructures comprise an atom selected from the group consisting of B, Al, Ga, In, and Ti.
12. The nanostructure of claim 9 , wherein the nanostructures are substantially free of Si, phosphonic acid, phosphinic acid, carboxylic acid, tri-n-alkyl phosphines, and/or tri-n-alkyl phosphine oxides.
13. The nanostructure of claim 9 , wherein a surface of the nanostructures is associated with a sulfonic acid, a boronic acid; or a deprotonated form or condensate thereof.
14. The nanostructure of claim 12 , wherein a surface of the nanostructures is associated with a carboxylic acid or a deprotonated form or condensate thereof, and/or a surfactant comprising of a Group V atom substituted with three unsaturated groups.