Mask, method for manufacturing the same and process device
View Patent ↗A mask and a method of making the mask are disclosed. The mask includes a transition region including at least one first region having a first thickness, and an active region having another thickness, where the thickness of the active region is greater than the first thickness. The method of making the mask includes forming a plurality of patterns in a mask body, the patterns being formed in regions of the mask body corresponding with the active region and the transition region of the mask.
1. A mask, comprising:
a transition region comprising at least one first region having a first thickness; and
at least two active regions separated by the transition region, wherein a thickness of the active regions is greater than the first thickness;
wherein each of the active regions corresponds to a whole display area of a display panel and functions as an evaporation region, wherein the transition region corresponds to a transition area between display panels and functions as a non-evaporation region;
wherein each of the active regions comprises gaps for evaporation and non-etched portion, and wherein the thickness of the active region is equal to the thickness of the non-etched portion.
2. The mask of claim 1 , wherein the transition region further comprises at least one second region having a second thickness, wherein the second thickness is different from the first thickness.
3. The mask of claim 2 , wherein the second thickness is greater than the first thickness.
4. The mask of claim 3 , wherein the second thickness is equal to the thickness of the active region.
5. The mask of claim 2 , wherein at least one of the first region and the second region is consistent with a pattern in the active region in terms of at least one of arrangement direction, spacing distance, shape and size.
6. The mask of claim 1 , wherein the first thickness is in a range of 20% to 80% of the thickness of the active region.
7. The mask of claim 3 , wherein the first region is located at a peripheral area of the mask, wherein the second region is located between the active regions adjacent to each other, wherein the second thickness is less than the thickness of the active region, and wherein the first thickness is 90% of the second thickness.
8. The mask of claim 7 , wherein the second thickness is in a range of 30% to 85% of the thickness of the active region.
9. The mask of claim 2 , wherein at least one of the first region and the second region has a shape selected from a group consisting of a bar shape, a square shape, a circular shape, and a combination of at least two thereof.
10. The mask of claim 9 , wherein the shape of the first region is different from the shape of the second region.
11. The mask of claim 3 , wherein at least one of the first region and the second region is consistent with a pattern in the active region in terms of at least one of arrangement direction, spacing distance, shape and size.
12. The mask of claim 4 , wherein at least one of the first region and the second region is consistent with a pattern in the active region in terms of at least one of arrangement direction, spacing distance, shape and size.