IP Library Granted Patent US 9,969,627
Granted Patent B2
US 9,969,627 · App. 14/516,917 · Granted May 15, 2018

Liquid treatment apparatus and liquid treatment method

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,969,627
App. No.
14/516,917
Granted
May 15, 2018
Kind
B2
Abstract

A liquid treatment apparatus for treating water to be treated, according to the present disclosure, includes a treatment tank, a dielectric partition wall dividing inside of the treatment tank into a first space in which the water to be treated is injected, and a second space in which an electrolytic solution is filled, a first electrode at least part of which is arranged in the first space of the treatment tank, a second electrode at least part of which is arranged in the second space of the treatment tank, and a power supply that applies a high-frequency AC voltage between the first electrode and the second electrode.

Claims (52)

1. A liquid treatment apparatus for treating water to be treated, the liquid treatment apparatus comprising:

a treatment tank;

a dielectric partition wall dividing inside of the treatment tank into a first space in which the water to be treated is injected, and a second space in which an electrolytic solution is filled;

at least one first electrode at least part of which is arranged in the first space of the treatment tank;

a second electrode of at least part which is arranged in the second space of the treatment tank; and

a power supply that applies an AC voltage having a frequency of 1 kHz or more between the first electrode and the second electrode,

wherein the dielectric partition wall has a surface including a plurality of stepped faces on a side of the first space.

2. The liquid treatment apparatus according to claim 1 , wherein the dielectric partition wall blocks off inflow of the water to be treated into the second space and inflow of the electrolytic solution into the first space.

3. The liquid treatment apparatus according to claim 1 , wherein the second electrode is grounded.

4. The liquid treatment apparatus according to claim 1 , wherein:

the treatment tank includes:

an inlet through which the water to be treated is injected to the first space; and

an outlet through which the water having been treated is drained from the first space,

the inlet is arranged in a first surface of the treatment tank, and

the outlet is arranged in a second surface of the treatment tank, the second surface opposing to the first surface, the outlet being located at a different position from an extension line extending from the inlet into a direction of injecting the water to be treated.

5. The liquid treatment apparatus according to claim 1 , wherein the treatment tank includes a gas bleeding hole in the second space.

6. The liquid treatment apparatus according to claim 1 , wherein the at least one first electrode comprises a plurality of first electrodes.

7. The liquid treatment apparatus according to claim 1 , wherein the power supply applies a bipolar pulse voltage.

8. The liquid treatment apparatus according to claim 1 , further comprising a gas supplying apparatus that supplies gas into the water to be treated from outside of the treatment tank, the water to be treated being present in the first space of the treatment tank.

9. The liquid treatment apparatus according to claim 8 , wherein:

the gas supplying apparatus supplies the gas into the water to be treated, generating a gas bubble that surrounds a conductive region, which is exposed to the first space, of the first electrode, and

the power supply applies the AC voltage between the first electrode and the second electrode, causing discharge in the gas bubble and generating plasma.

10. The liquid treatment apparatus according to claim 9 , further comprising an insulator in contact with an outer peripheral surface of the first electrode,

wherein the first electrode has a hollow cylindrical shape with an opening through which a hollow space defined by an inner peripheral surface of the first electrode communicates with the first space of the treatment tank,

the gas supplying apparatus supplies the gas into the water to be treated through the hollow space and the opening of the first electrode, and

the conductive region of the first electrode is not covered with the insulator.

11. The liquid treatment apparatus according to claim 1 , further comprising an insulator surrounding a periphery of the first electrode with a gap between the insulator and the periphery of the first electrode, the insulator including an opening through which the gap communicates with the first space of the treatment tank.

12. The liquid treatment apparatus according to claim 11 , wherein:

the power supply applies the AC voltage between the first electrode and the second electrode, to vaporize a liquid in the gap to produce gas, and

the application of the power supply causes discharge in a gas bubble to generate plasma, when the gas is let out as the gas bubble from the opening into the water to be treated, the water to be treated being present in the first space of the treatment tank.

13. The liquid treatment apparatus according to claim 11 , further comprising a gas supplying apparatus that supplies gas to the gap.

14. The liquid treatment apparatus according to claim 13 , wherein:

the gas supplying apparatus supplies the gas into the water to be treated through the gap and the opening of the insulator, generating a gas bubble in the water to be treated, the water to be treated being present in the first space of the treatment tank, and

the power supply applies the AC voltage between the first electrode and the second electrode, causing discharge in the gas bubble to generate plasma.

15. A liquid treatment apparatus for treating water to be treated, the liquid treatment apparatus comprising:

a treatment tank;

a dielectric partition wall dividing inside of the treatment tank into a first space in which the water to be treated is injected, and a second space in which an electrolytic solution is filled;

at least one first electrode at least part of which is arranged in the first space of the treatment tank;

a second electrode of at least part which is arranged in the second space of the treatment tank;

a power supply that applies an AC voltage between the first electrode and the second electrode;

an insulator surrounding a periphery of the first electrode with a gap between the insulator and the periphery of the first electrode, the insulator including an opening through which the gap communicates with the first space of the treatment tank; and

a gas purging apparatus that purges the gas remaining in the gap prior to starting the treatment of the water to be treated.

16. A liquid treatment apparatus for treating water to be treated, the liquid treatment apparatus comprising:

a treatment tank;

a dielectric partition wall dividing inside of the treatment tank into a first space in which the water to be treated is injected, and a second space in which an electrolytic solution is filled;

at least one first electrode at least part of which is arranged in the first space of the treatment tank;

a second electrode of at least part which is arranged in the second space of the treatment tank; and

a power supply that applies an AC voltage having a frequency of 1 kHz or more between the first electrode and the second electrode,

wherein the dielectric partition wall has a surface including a plurality of stepped faces that are exposed to the first space.

17. The liquid treatment apparatus according to claim 16 , wherein the plurality of stepped faces are arranged on the surface in a matrix configuration.

18. The liquid treatment apparatus according to claim 16 , wherein depths or heights of the plurality of stepped face are each in a range from 0.1 mm to 3 mm.

19. The liquid treatment apparatus according to claim 1 , wherein the dielectric partition wall is made of acrylic resin, polycarbonate, polyvinylidene fluoride, or barium titanate.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 18, 2015
From: PANASONIC CORPORATION
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 035045/0413 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 27, 2014
From: IMAI, SHIN-ICHI; FUJIKANE, MASAKI
To: PANASONIC CORPORATION
Reel/Frame 034045/0328 →