Low temperature silicon nitride films using remote plasma CVD technology
Embodiments of the present invention generally provide methods for forming a silicon nitride layer on a substrate. In one embodiment, a method of forming a silicon nitride layer using remote plasma chemical vapor deposition (CVD) at a temperature that is less than 300 degrees Celsius is disclosed. The precursors for the remote plasma CVD process include tris(dimethylamino)silane (TRIS), dichlorosilane (DCS), trisilylamine (TSA), bis-t-butylaminosilane (BTBAS), hexachlorodisilane (HCDS) or hexamethylcyclotrisilazane (HMCTZ).
1. A method, comprising:
forming a silicon nitride layer on a substrate in a processing region of a processing chamber by a remote plasma chemical vapor deposition process at a deposition temperature less than 300 degrees Celsius, wherein the remote plasma chemical vapor deposition process utilizes a processing gas mixture, wherein the processing gas mixture includes tris(dimethylamino)silane, di-t-butylaminosilane, or hexamethylcyclotrisilazane, and wherein the processing gas mixture is excited to form a plasma in a plasma cavity that is remote from the processing region, the plasma cavity is defined by a first electrode and a second electrode, and the first electrode and the second electrode are electrically isolated by an isolator ring.
2. The method of claim 1 , wherein the deposition temperature ranges from about 20 degrees Celsius to about 250 degrees Celsius.
3. The method of claim 2 , wherein the silicon nitride layer has a refractive index of 1.8 when the deposition temperature is about 20 degrees Celsius.
4. The method of claim 2 , wherein the silicon nitride layer has a refractive index of 2.2 when the deposition temperature is higher than 20 degrees Celsius.
5. The method of claim 1 , further comprising curing the silicon nitride layer.
6. The method of claim 5 , wherein the curing the silicon nitride layer includes UV curing or ebeam curing.
7. The method of claim 1 , wherein the processing gas mixture further includes a carrier gas.
8. A method, comprising:
forming a silicon nitride layer on a substrate in a processing region of a processing chamber by a remote plasma chemical vapor deposition process, wherein the deposition temperature ranges from about 20 degrees Celsius to about 250 degrees Celsius, wherein the remote plasma chemical vapor deposition process utilizes a processing gas mixture, wherein the processing gas mixture includes tris(dimethylamino)silane, di-t-butylaminosilane, hexamethylcyclotrisilazane, argon or combination thereof, and wherein the processing gas mixture is excited to form in a plasma cavity that is remote from the processing region, the plasma cavity is defined by a first electrode and a second electrode, and the first electrode and the second electrode are electrically isolated by an isolator ring.
9. The method of claim 8 , wherein the silicon nitride layer has a refractive index of 1.8 when the deposition temperature is about 20 degrees Celsius.
10. The method of claim 9 , wherein the silicon nitride layer has a refractive index of 2.2 when the deposition temperature is higher than 20 degrees Celsius.
11. The method of claim 8 , further comprising curing the silicon nitride layer.
12. The method of claim 11 , wherein the curing the silicon nitride layer includes UV curing or e-beam curing.