IP Library Granted Patent US 9,236,569
Granted Patent B2
US 9,236,569 · App. 14/525,269 · Granted Jan 12, 2016

Storage element

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Quick Facts
Patent No.
US 9,236,569
App. No.
14/525,269
Granted
Jan 12, 2016
Kind
B2
Abstract

A storage element includes a first electrode and a second electrode separated by a gap and a dielectric layer provided between the first electrode and the second electrode to fill the gap. A separation distance of the gap changes in response to application of a voltage to a space between the first electrode and the second electrode, such that a switching phenomenon is produced which switches a resistance state between the first electrode and the second electrode between a high resistance state in which it is difficult for tunnel current to flow and a low resistance state in which it is easy for tunnel current to flow.

Claims (32)

1. A storage element comprising:

a first electrode and a second electrode separated by a gap; and

a dielectric layer located in the gap between the first electrode and the second electrode; wherein

a separation distance of the gap changes in response to application of a voltage to the gap between the first electrode and the second electrode;

a resistance state between the first electrode and the second electrode switches between a high resistance state and a low resistance state, according to the separation distance of the gap; and

the dielectric layer is a dielectric thin film with a softened inter-atomic bond structure.

2. The storage element according to claim 1 , wherein the dielectric layer is anisotropic in a lamination direction and a lamination plane direction.

3. The storage element according to claim 1 , wherein the dielectric layer has a thickness of about 3 nm or less.

4. The storage element according to claim 1 , wherein

the first electrode and the second electrode each include a base portion;

the base portion on the first electrode side and the base portion on the second electrode side face each other across the separation distance;

the separation distance is set to enable a tunnel current between the first electrode and the second electrode to be generated;

at least one of the first electrode and the second electrode includes a low-melting-point portion in the portion where the base portions face each other;

when the first electrode includes the low-melting-point portion, the low-melting-point portion is made of a substance with a melting point lower than a substance of the base portion on the first electrode side; and

when the second electrode includes the low-melting-point portion, the low-melting-point portion is made of a substance with a melting point lower than a substance of the base portion on the second electrode side.

5. The storage element according to claim 4 , wherein the low-melting-point portion is provided at least in one of the first electrode and the second electrode that has a relatively higher potential when the voltage is applied.

6. The storage element according to claim 4 , wherein the low-melting-point portion is provided in both the first electrode and the second electrode.

7. The storage element according to claim 1 , wherein the dielectric layer is arranged to fill the gap.

8. The storage element according to claim 1 , wherein the dielectric layer is arranged to hermetically seal the gap.

9. The storage element according to claim 1 , wherein the dielectric layer is configured such that the separation distance of the gap changes due to movement of metal atoms into voids or defects within the dielectric layer.

10. The storage element according to claim 1 , wherein each of the first electrode and the second electrode has a single layer structure.

11. The storage element according to claim 1 , wherein one of the first electrode and the second electrode has a single layer structure and the other of the first electrode and the second electrode has a double layer structure.

12. The storage element according to claim 1 , wherein both of the first electrode and the second electrode have a double layer structure.

13. The storage element according to claim 1 , wherein

the first electrode and the second electrode each include a base portion and a low-melting point portion;

the gap defined by the low-melting-point portions made of a substance with a relatively low melting point and the low-melting-point portions are sandwiched between the base portions which are made of a substance with a relatively high melting point.

14. The storage element according to claim 1 , wherein

the first electrode and the second electrode each include a base portion and a low-melting point portion;

the base portions define and function as stoppers that limit movement of the low-melting-point portions to prevent the low-melting-point portions from moving and widening the separation distance beyond a predetermined amount when transitioning to the high resistance state.

15. The storage element according to claim 1 , wherein one of the first electrode and the second electrode includes both a base portion and a low-melting point portion, and the other of the first electrode and the second electrode includes a base portion but does not include a low-melting point portion.

16. The storage element according to claim 1 , wherein the storage element is a vertically structured storage element.

17. The storage element according to claim 1 , wherein the storage element is a horizontally structured storage element.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2025
From: FUNAI GROUP CO., LTD
To: FUNAI ELECTRIC CO., LTD.
Reel/Frame 073121/0824 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2025
From: FUNAI ELECTRIC CO., LTD. (F/K/A FE-TECH CO., LTD.)
To: FEC IP LLC
Reel/Frame 073121/0883 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 28, 2014
From: FURUTA, SHIGEO; MASUDA, YUICHIRO; TAKAHASHI, TSUYOSHI; ONO, MASATOSHI; HAYASHI, YUTAKA; ITAYA, TARO; NAITOH, YASUHISA; SHIMIZU, TETSUO
To: FUNAI ELECTRIC CO., LTD.
Reel/Frame 034046/0945 →