Self-assembled nanoparticles with polymeric and/or oligomeric ligands
In one embodiment, a structure includes: a substrate; and a monolayer of nanoparticles positioned above the substrate, where the nanoparticles are each grafted to one or more oligomers and/or polymers, and where each of the polymers and/or oligomers includes at least a first functional group configured to bind to the nanoparticles. In another embodiment, a structure includes: a substrate; a structured layer positioned above the substrate, the structured layer comprising a plurality of nucleation regions and a plurality of non-nucleation regions; and a crystalline layer positioned above the structured layer, where the plurality of nucleation regions have a pitch in a range between about 5 nm to about 20 nm.
1. A structure comprising a substrate and a monolayer of nanoparticles positioned above the substrate;
wherein the nanoparticles each bind to one or more functionalized ligands, wherein the functionalized ligands comprise oligomers and/or polymers,
wherein each of the oligomers and/or polymers has a first functional group and a second functional group and are selected from the group consisting of polystyrene, polymethyl methacrylate, polyvinyl pyridine, polyferrocenyldimethylsilane, polyethylene oxide, polylactic acid, polytrimethylsilylstyrene, polyisoprene, polybutadiene, and combinations of two or more thereof;
wherein the first functional group binds to the nanoparticle by a covalent bond, an ionic bond, a hydrogen bond, van der Waals forces, dispersion forces, dipole-dipole interactions, or combinations thereof, and
the second functional group binds to the substrate by a covalent bond, an ionic bond, a hydrogen bond, van der Waals forces, dispersion forces, dipole-dipole interactions, or combinations thereof and is independently selected from a group consisting of a hydroxyl, a carboxyl, and an amine.
2. The structure as recited in claim 1 , wherein each of the nanoparticles independently comprises a material selected from a group consisting of: a metal, a dielectric, and a semiconductor.
3. The structure as recited in claim 1 , wherein each of the nanoparticles has a diameter in a range between about 1 nm to about 15 nm, wherein a pitch between adjacent nanoparticles is in a range between about 5 to about 20 nm.
4. The structure as recited in claim 1 , wherein each of the polymers and/or oligomers has an average molecular weight between about 0.5 kDa to about 10 kDa.
5. The structure as recited in claim 1 , wherein the second functional group of each of the polymers and/or oligomers binds to the substrate by a covalent bond, an ionic bond, a hydrogen bond, or combinations thereof.
6. The structure as recited in claim 1 , wherein the monolayer of the nanoparticles positioned above the substrate has a nanoparticle surface coverage between about 80% to about 120%.
7. The structure as recited in claim 1 , wherein the substrate includes topographic and/or chemical contrast guiding features.
8. The structure as recited in claim 1 , wherein the monolayer of nanoparticles includes a plurality of recessed regions and a plurality of non-recessed regions.
9. The structure as recited in claim 8 , wherein a depth of the recessed regions is greater than a thickness of the monolayer of nanoparticles.
10. The structure as recited in claim 8 , wherein a depth of the recessed regions is about equal to or less than a thickness of the monolayer of nanoparticles.
11. The structure as recited in claim 8 , wherein the plurality of non-recessed regions include nucleation regions, and wherein the plurality of recessed regions include non-nucleation regions.
12. The structure as recited in claim 8 , wherein the plurality of non-recessed regions include non-nucleation regions, and wherein the plurality of recessed regions include nucleation regions.
13. The structure as recited in claim 8 , further comprising one or more crystalline layers positioned above the monolayer of nanoparticles.
14. The structure as recited in claim 13 , wherein at least one of the one or more crystalline layers is a granular magnetic recording layer.
15. The structure as recited in claim 1 , wherein the monolayer of the nanoparticles is configured for use as an etch mask for pattern transfer into the substrate, wherein the substrate includes at least one of a metal, a dielectric material, and a semiconductor material.
16. A magnetic data storage system, comprising:
at least one magnetic head,
the structure as recited in claim 1 ;
a drive mechanism for passing the structure over the at least one magnetic head; and
a controller electrically coupled to the at least one magnetic head for controlling operation of the at least one magnetic head.
17. A structure comprising a monolayer of nanoparticles positioned above a substrate, the substrate comprising a chemical contrast guiding pattern;
wherein the nanoparticles each bind to one or more functionalized ligands, wherein the functionalized ligands comprise oligomers and/or polymers,
wherein each of the oligomers and/or polymers has a first functional group and a second functional group and are selected from the group consisting of polystyrene, polymethyl methacrylate, polyvinyl pyridine, polyferrocenyldimethylsilane, polyethylene oxide, polylactic acid, polytrimethylsilylstyrene, polyisoprene, polybutadiene, and combinations of two or more thereof;
wherein the first functional group binds to the nanoparticle by a covalent bond, an ionic bond, a hydrogen bond, van der Waals forces, dispersion forces, dipole-dipole interactions, or combinations thereof, and
the second functional group binds to the chemical contrast guiding pattern by a covalent bond, an ionic bond, a hydrogen bond, van der Waals forces, dispersion forces, dipole-dipole interactions, or combinations thereof and is independently selected from a group consisting of a hydroxyl, a carboxyl, and an amine.
18. The structure as recited in claim 17 , wherein each of the nanoparticles has a diameter in a range between about 1 nm to about 15 nm, wherein a pitch between adjacent nanoparticles is in a range between about 5 to about 20 nm.
19. The structure as recited in claim 17 , wherein each of the polymers and/or oligomers has an average molecular weight between about 0.5 kDa to about 10 kDa.
20. The structure as recited in claim 17 , wherein the second functional group binds to the substrate by a covalent bond, an ionic bond, a hydrogen bond, or combinations thereof.
21. The structure as recited in claim 17 , further comprising one or more crystalline layers positioned above the monolayer of nanoparticles.
22. The structure as recited in claim 21 , wherein at least one of the one or more crystalline layers is a granular magnetic recording layer.
23. The structure as recited in claim 17 , wherein the substrate further includes topographic guiding features.
24. The structure as recited in claim 1 , wherein each of the oligomers and/or polymers are selected from the group consisting of polystyrene, polymethyl methacrylate, polyvinyl pyridine, polyethylene oxide, polylactic acid, polytrimethylsilylstyrene, polyisoprene, polybutadiene, and combinations of two or more thereof.
25. The structure as recited in claim 17 , wherein each of the oligomers and/or polymers are selected from the group consisting of polystyrene, polymethyl methacrylate, polyvinyl pyridine, polyethylene oxide, polylactic acid, polytrimethylsilylstyrene, polyisoprene, polybutadiene, and combinations of two or more thereof.