Process For Forming And Composite Comprising Conducting Paths Comprising Silver
The invention relates generally to a process ( 100 ) comprising as process steps: a) providing a substrate having a substrate surface; b) providing a first composition, comprising: i) SnCl 2 , and ii) water; c) providing a second composition, comprising: i) sulfuric acid, and ii) a reducing agent; d) providing a third composition, obtainable by mixing: i) AgNO 3 , ii) nitric acid, iii) water, and iv) NH 3 ; e) contacting the substrate surface with the first composition under obtaining an activated substrate surface; f) contacting the activated substrate surface with the second composition and the third composition, wherein the activated substrate surface has a temperature in a range from about 10 to about 50° C. The invention further relates to a composite obtainable by the above process; to a composite comprising an Ag-comprising layer; to a composition comprising AgNO 3 ; and to a use of composition comprising AgNO 3 for forming conducting paths.
1 . A process ( 100 ) comprising as process steps:
a) providing a substrate having a substrate surface;
b) providing a first composition, comprising:
i) SnCl 2 , and
ii) water;
c) providing a second composition, comprising:
i) sulfuric acid, and
ii) a reducing agent;
d) providing a third composition, obtainable by mixing:
i) AgNO 3 ,
ii) nitric acid,
iii) water, and
iv) NH 3 ;
e) contacting the substrate surface with the first composition under obtaining an activated substrate surface;
f) contacting the activated substrate surface with the second composition and the third composition, wherein the activated substrate surface has a temperature in a range from about 10 to about 50° C.
2 . The process ( 100 ) according to claim 1 , wherein the reducing agent is a sugar.
3 . The process ( 100 ) according to claim 1 , wherein the first composition comprises Ag in a range of less than 1 wt.-% based on the total weight of the first composition.
4 . The process ( 100 ) according to claim 1 , wherein
a) the process ( 100 ) comprises as a further process step, providing a fourth composition, comprising
i) NaOH,
ii) NH 3 , and
iii) water; and
b) the process step f) further comprises contacting the activated substrate surface with the fourth composition.
5 . The process ( 100 ) according to claim 4 , wherein before contacting the substrate surface with the second composition, the third composition and the fourth composition;
the third composition and the fourth composition are mixed.
6 . The process ( 100 ) according to claim 1 , wherein one selected from the group consisting of the first composition, the second composition, and the third composition or a combination of at least two thereof comprises further cations other than the present cations of each of the group consisting of Sn, Na and Ag in a range of less than 1 ppmw based on the total weight of the composition characterised by this feature.
7 . The process ( 100 ) according to claim 1 , wherein less than 30 s before contacting the substrate surface with the second composition and the third composition; the second composition and the third composition are mixed.
8 . The process ( 100 ) according to claim 1 , wherein the substrate comprises one selected from the group consisting of a polymer, a ceramic, a semiconductor, a stone and a glass or a combination of at least two thereof.
9 . The process ( 100 ) according to claim 8 , wherein the polymer is one selected from the group consisting of a polyimide, a polyester, PEDOT:PSS, polyacetylene, polyphenylene vinylene, polypyrrole, polythiophene, polyaniline and polyphenylene sulfide or a combination of at least two thereof.
10 . The process ( 100 ) according to claim 1 , wherein a first layer is obtained by the process ( 100 ),
wherein the first layer
a) superimposes the substrate surface,
b) comprises Ag, and
c) comprises a first layer surface,
wherein the first layer has a layer thickness which is described by a non-constant function of the position on the substrate surface.
11 . The process ( 100 ) according to claim 10 , wherein the first layer has a layer thickness in a range from about 10 nm to about 100 μm.
12 . The process ( 100 ) according to claim 10 , wherein the first layer comprises a protruding region having a width in a range from about 5 to about 100 μm.
13 . The process ( 100 ) according to claim 10 , wherein a further process step comprises superimposing the first layer surface by a further layer,
wherein the further layer is electrically conductive or transparent or both.
14 . The process ( 100 ) according to claim 13 , wherein the further layer comprises an electrically conductive polymer.
15 . The process ( 100 ) according to claim 1 , wherein the first composition comprises
a) SnCl 2 in a range from about 0.01 to about 1 wt.-%, and
b) water in a range from about 90 wt.-% to the remainder completing the sum of all components of the first composition to 100 wt.-%,
each based on the total weight of the first composition and all contents in wt.-% adding to 100 wt.-%.
16 . The process ( 100 ) according to claim 1 , wherein the second composition comprises
a) dextrose in a range from about 60 wt.-% to the remainder completing the sum of all components of the second composition to 100 wt.-%,
b) sulfuric acid in a range from about 10 to about 30 wt.-%, and
c) formaldehyde in a range from about 3 to about 15 wt.-%,
each based on the weight of the second composition excluding water and all contents in wt.-% adding to 100 wt.-%.
17 . The process ( 100 ) according to claim 1 , wherein the third composition is obtainable by mixing
a) AgNO 3 in a range from about 95 wt.-% to the remainder completing the sum of all components of the third composition to 100 wt.-%,
b) nitric acid in a range from about 0.5 to about 5 wt.-%, and
c) NH 3 in a range from about 0.01 to about 0.1 wt.-%,
each based on the weight of the third composition excluding water and all contents in wt.-% adding to 100 wt.-%.
18 . The process ( 100 ) according to claim 4 , wherein the fourth composition comprises
a) NaOH in a range from about 99 wt.-% to the remainder completing the sum of all components of the fourth composition to 100 wt.-%, and
b) NH 3 in a range from about 0.01 to about 1 wt.-%,
each based on the weight of the fourth composition excluding water and all contents in wt.-% adding to 100 wt.-%.
19 . A composite obtainable by the process ( 100 ) according to claim 1 .
20 . A composite, comprising a layer sequence ( 500 ),
wherein the layer sequence ( 500 ) comprises as layers:
a) a substrate ( 501 ) having a substrate surface ( 502 );
b) a first layer ( 503 ) having a first layer surface ( 504 ),
wherein the first layer ( 503 )
i) superimposes the substrate surface ( 502 ),
ii) comprises Ag,
iii) fulfils at least one of the following criteria
A. the first layer ( 503 ) comprises a crystallite having a crystallite size in a range from about 10 to about 160 nm,
B. the first layer ( 503 ) has a surface resistivity of less than 10 Ω/sq,
C. the first layer ( 503 ) has a layer thickness in a range from about 10 nm to about 10 μm,
D. the first layer ( 503 ) has a gloss in a range from about 500 to about 2000 GU, and
E. the first layer ( 503 ) has an average roughness in a range from about 1 to about 500 nm,
or a combination of at least two or more thereof.
21 . The composite according to claim 20 , wherein the layer sequence ( 500 ) comprises a further layer ( 507 ),
wherein the further layer ( 507 ) superimposes the first layer surface ( 504 ),
wherein the further layer ( 507 ) is transparent or electrically conductive or both.
22 . The composite according to claim 21 , wherein the further layer ( 507 ) comprises an electrically conductive polymer.
23 . The composite according to claim 21 , wherein the further layer ( 507 ) has a layer thickness in a range from about 50 to about 350 nm.
24 . The composite according to claim 20 , wherein the first layer ( 503 ) has a layer thickness which is described by a non-constant function of the position on the substrate surface ( 502 ).
25 . The composite according to claim 24 , wherein the first layer ( 503 ) comprises a protruding region ( 505 ) having a width ( 506 ) in a range from about 5 to about 100 μm.
26 . A composition obtainable by mixing
a) an aldehyde,
b) sulfuric acid,
c) a further organic compound,
d) AgNO 3 ,
e) nitric acid,
f) water,
g) NH3, and
h) NaOH.