Composition including material, methods of depositing material, articles including same and systems for depositing material
View Patent ↗Methods for depositing nanomaterial onto a substrate are disclosed. Also disclosed are compositions useful for depositing nanomaterial, methods of making devices including nanomaterials, and a system and devices useful for depositing nanomaterials.
1. A method for depositing a nanomaterial onto a substrate, the method comprising:
applying a composition comprising the nanomaterial comprising a plurality of semiconductor nanocrystals to an applicator surface;
positioning a mask including a predetermined pattern of apertures comprising a predetermined shape and size on the substrate; and
contacting the applicator surface to the substrate through the apertures to apply a pattern of the nanomaterial to the substrate, wherein the applicator including the composition is dried prior to contacting the substrate.
2. A method
in accordance with claim 1 wherein the composition comprising the nanomaterial comprising a plurality of semiconductor nanocrystals is applied to the applicator surface from a transfer surface.
3. A method for depositing a nanomaterial onto a substrate, the method comprising:
applying a composition comprising the nanomaterial comprising a population of semiconductor nanocrystals to an applicator surface;
positioning a mask including a predetermined pattern of apertures comprising a predetermined shape and size on the substrate; and
contacting the applicator surface to the substrate through the apertures to apply a pattern of the nanomaterial to the substrate, wherein the applicator including the composition is dried prior to contacting the substrate.
4. A method
in accordance with claim 3 wherein the composition comprising the nanomaterial comprising a population of semiconductor nanocrystals is applied to the applicator surface from a transfer surface.
5. A method in accordance with claim 1 wherein the steps are repeated to separately deposit each of one or more additional compositions comprising semiconductor nanocrystals onto the substrate through apertures in the mask.
6. A method in accordance with claim 1 wherein the semiconductor nanocrystals comprise a core/shell structure.
7. A method in accordance with claim 1 wherein the semiconductor nanocrystals comprise a core/shell structure, wherein the core comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.
8. A method in accordance with claim 1 wherein the semiconductor nanocrystals comprise a core/shell structure, wherein the shell comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.
9. A method in accordance with claim 1 wherein the semiconductor nanocrystals include at least one ligand attached to the surface.
10. A method in accordance with claim 1 wherein the mask comprises a polyimide film, a fluorinated polyimide film, or a film including a fluorinated polyimide coating on at least one surface thereof.
11. A method in accordance with claim 3 wherein the applicator including the composition is dried prior to contacting the substrate.
12. A method in accordance with claim 3 wherein the steps are repeated to separately deposit each of one or more additional compositions comprising semiconductor nanocrystals onto the substrate through apertures in the mask.
13. A method in accordance claim 3 wherein the semiconductor nanocrystals comprise a core/shell structure.
14. A method in accordance with claim 3 wherein the semiconductor nanocrystals comprise a core/shell structure, wherein the core comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.
15. A method in accordance with claim 3 the semiconductor nanocrystals comprise a core/shell structure, wherein the shell comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof and/or mixtures thereof.
16. A method in accordance with claim 3 wherein the semiconductor nanocrystals include at least one ligand attached to the surface.
17. A method in accordance with claim 3 wherein the mask comprises a polyimide film, a fluorinated polyimide film, or a film including a fluorinated polyimide coating on at least one surface thereof.