IP Library Patent Application 14589847
Patent Application
App. No. 14/589,847

POROUS SILICON ELECTRO-ETCHING SYSTEM AND METHOD

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Quick Facts
Patent No.
US None
App. No.
14/589,847
Abstract

It is an object of this disclosure to provide high productivity, low cost-of-ownership manufacturing equipment for the high volume production of photovoltaic (PV) solar cell device architecture. It is a further object of this disclosure to reduce material processing steps and material cost compared to existing technologies by using gas-phase source silicon. The present disclosure teaches the fabrication of a sacrificial substrate base layer that is compatible with a gas-phase substrate growth process. Porous silicon is used as the sacrificial layer in the present disclosure. Further, the present disclosure provides equipment to produce a sacrificial porous silicon PV cell-substrate base layer.

Claims (41)

1 . An apparatus for producing porous silicon on a front side of a silicon wafer comprising:

a housing;

at least one vertically oriented electrolytic cell comprising:

an anode;

a cathode; and

an electrolyte;

a sealing mechanism within said electrolytic cell, said sealing mechanism comprising a surface for contacting a back side of the silicon wafer, said sealing mechanism not in contact with the front side of the silicon wafer; and

a rinsing mechanism for removing said electrolyte from the silicon wafer.

2 . The apparatus of claim 1 , wherein said rinsing mechanism comprises a spray of deionized water.

3 . The apparatus of claim 1 , wherein said rinsing mechanism comprises a tank of deionized water.

4 . The apparatus of claim 1 , wherein said sealing mechanism comprises a first pallet, said first pallet comprising:

an electrically insulating material;

an opening for holding the silicon wafer; and

an edge capable of being attached to a second pallet.

5 . The apparatus of claim 4 , further comprising

a motor for moving said first pallet through said at least one electrolytic cell.

6 . The apparatus of claim 1 , wherein said sealing mechanism comprises a circumferential seal within said electrolytic cell.

7 . The apparatus of claim 6 , further comprising a mechanism capable of placing the silicon wafer inside said electrolytic cell and removing the silicon wafer from said electrolytic cell.

8 . The apparatus of claim 1 , wherein said at least one electrolytic cell comprises a plurality of electrolytic cells.

9 . The apparatus of claim 1 , wherein said electrolyte of said at least one electrolytic cell comprises HF/IPA.

10 . The apparatus of claim 1 , wherein said at least one electrolytic cell further comprises an electrolyte jet for removing a gas from said anode.

11 . The apparatus of claim 1 , wherein said at least one electrolytic cell further comprises an electrolyte jet for removing a gas from said cathode.

12 . A method for producing porous silicon on a silicon wafer, said method comprising the steps of:

placing the silicon wafer within a non-confined electrolytic cell;

supporting the silicon wafer on a surface within said non-confined electrolytic cell, said electrolytic cell comprising:

an electrolyte,

an anode, and

a cathode;

passing an electrical current through the wafer, said electrical current producing a layer of porous silicon on a top surface of the wafer;

removing the wafer from said non-confined electrolytic cell; and

rinsing said electrolyte from the silicon wafer.

13 . The method of claim 12 , further comprising

transporting the wafer on a pallet.

14 . The method of claim 12 , wherein said rinsing step comprises passing the silicon wafer through a rinse tank comprising deionized water.

15 . The method of claim 12 , wherein said rinsing step comprises spraying the silicon wafer with deionized water.

16 . The method of claim 13 , further comprising:

transporting said pallet supporting the wafer through a plurality of non-confined electrolytic cells.

17 . The method of claim 12 , wherein said electrolyte comprises HF/IPA.

18 . The method of claim 12 , further comprising removing a gas from said anode with a jet of said electrolyte.

19 . The method of claim 12 , further comprising removing a gas from said cathode with a jet of said electrolyte.

20 . The method of claim 12 , wherein said non-confined electrolytic cell is oriented vertically.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2018
From: BEAMREACH-SOLEXEL ASSETS, LLC
To: TRUTAG TECHNOLOGIES, INC.
Reel/Frame 046279/0981 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2018
From: OB REALTY, LLC
To: BEAMREACH-SOLEXEL ASSETS LLC
Reel/Frame 046493/0343 →
ASSIGNMENT OF LOAN DOCUMENTS Recorded Sep 29, 2017
From: OPUS BANK
To: OB REALTY, LLC
Reel/Frame 044062/0383 →
CHANGE OF NAME Recorded Jul 28, 2017
From: SOLEXEL, INC.
To: BEAMREACH SOLAR, INC.
Reel/Frame 043367/0649 →
RECORDATION OF FORECLOSURE OF PATENT PROPERTIES Recorded Jul 27, 2017
From: OB REALTY, LLC
To: OB REALTY, LLC
Reel/Frame 043350/0822 →
CHANGE OF NAME Recorded Jul 26, 2017
From: SOLEXEL, INC.
To: BEAMREACH SOLAR, INC.
Reel/Frame 043342/0439 →