Thin film transistor array panel and manufacturing method thereof

1. A thin film transistor array panel, comprising:

a substrate;

a thin film transistor positioned on the substrate;

a first passivation layer positioned on the thin film transistor;

a common electrode positioned on the first passivation layer;

a second passivation layer positioned on the common electrode;

a pixel electrode positioned on the second passivation layer and coupled to the thin film transistor through a first contact hole; and

a first contact assistant positioned on the second passivation layer and coupled to a storage electrode pad portion and the common electrode through a second contact hole,

wherein the first contact hole penetrates the first passivation layer, the common electrode, and the second passivation layer,

wherein a first part of the first contact hole formed in the common electrode is larger than a second part of the first contact hole formed in the second passivation layer,

wherein the second contact hole penetrates the first passivation layer, the common electrode, and the second passivation layer,

wherein a horizontal contact hole width between edges of the common electrode for a second part of the second contact hole formed in the common electrode is smaller than a horizontal contact hole width between edges of the second passivation layer for a third part of the second contact hole formed in the second passivation layer,

wherein a horizontal contact hole width between vertical bottom edges of the common electrode for the second part of the second contact hole formed in the common electrode is larger than a horizontal contact hole width between vertical top edges of the first passivation layer for a first part of the second contact hole formed in the first passivation layer, and

wherein the second passivation layer does not contact the common electrode in the first part of the first contact hole.

2. The thin film transistor array panel of claim 1 , further comprising an empty space disposed between the common electrode and the pixel electrode.

3. The thin film transistor array panel of claim 1 , wherein the pixel electrode has a thickness of more than about 500 Å.

4. The thin film transistor array panel of claim 1 , further comprising an organic layer interposed between the first passivation layer and the second passivation layer.

5. The thin film transistor array panel of claim 1 , comprising the storage electrode pad portion disposed outside a pixel area, wherein a storage electrode line is extended from the storage electrode pad portion into the pixel area, wherein a common voltage is applied to the storage electrode pad portion.

6. The thin film transistor array panel of claim 1 , further comprising a gate driver,

wherein the gate driver includes a data layer signal line that is electrically coupled to a gate pad portion of a pixel area using a second contact assistant, wherein the second contact assistant is connected to the data layer signal line and the gate pad portion through a third contact hole positioned in the gate driver and a fourth contact hole positioned in the pixel area, respectively.

7. The thin film transistor array panel of claim 1 , further comprising a gate driver including a data layer signal line, wherein the data layer signal line is extended from the gate driver to a third contact hole positioned in a pixel area, wherein the data layer signal line is connected to a gate pad portion through the third contact hole.

8. The thin film transistor array panel of claim 7 , comprising the storage electrode pad portion disposed in the pixel area, wherein the storage electrode pad portion is connected to the common electrode through the second contact hole disposed in the pixel area.