Static random access memory and manufacturing method thereof
A static random access memory and the manufacturing method thereof are provided. By forming the specific gate structure(s) to be concave gate structure(s) and by adjusting the ratio of the effective channel width for these gate structures, the performance of the static random access memory is enhanced.
1. A method for forming a static random access memory cell, comprising:
providing a semiconductor substrate, wherein the semiconductor substrate includes a plurality of isolation structures, and the semiconductor substrate includes at least one pull-down transistor region, at least one pull-up transistor region and at least one passing gate transistor region, the plurality of isolation structures define first active regions, second active regions and third active regions respectively in the at least one pull-down transistor region, the at least one pull-up transistor region and the at least one passing gate transistor region;
forming a patterned mask layer over the semiconductor substrate, wherein the patterned mask layer includes a first pattern, a second pattern and a third pattern respectively in the at least one pull-down transistor region, the at least one pull-up transistor region and the at least one passing gate transistor region, and the first pattern includes a plurality of first openings corresponding to the first active regions, the third pattern includes a plurality of third openings corresponding to the third active regions;
using the patterned mask layer as an etching mask to etch the semiconductor substrate, to form a plurality of first trenches in the at least one pull-down transistor region under the plurality of first openings and a plurality of third trenches in the at least one passing gate transistor region under the plurality of third openings;
forming a gate oxide layer conformally covering the semiconductor substrate and conformally covering inner surfaces of the first trenches in the at least one pull-down transistor region and inner surfaces of the third trenches in the at least one passing gate transistor region;
forming a conductive material layer covering the gate oxide layer and filling up the first trenches in the at least one pull-down transistor region and the third trenches in the at least one passing gate transistor region; and
patterning the conductive material layer and the gate oxide layer to form first gate structures, second gate structures and third gate structures respectively in the at least one pull-down transistor region, the at least one pull-up transistor region and the at least one passing gate transistor region; wherein the first gate structure has a first effective channel width, the second gate structure has a second effective channel width and the third gate structure has a third effective channel width, the first effective channel width is larger than the third effective channel width, and the third effective channel width is larger than the second effective channel width.
2. The method of claim 1 , wherein a width of the first trenches is larger than a width of the third trenches.
3. The method of claim 1 , wherein the second pattern includes a plurality of the second the openings corresponding to the second active regions, and a plurality of second trenches is formed in the at least one pull-up transistor region under the plurality of second openings.
4. The method of claim 3 , wherein the gate oxide layer conformally covers the semiconductor substrate and conformally covers inner surfaces of the plurality of second trenches in the at least one pull-up transistor region, and the conductive material layer covers the gate oxide layer and fills up the plurality of second trenches in the at least one pull-up transistor region.
5. The method of claim 4 , wherein a width of the first trenches is larger than a width of the third trenches, and a width of the third trenches is larger than a width of the second trenches.
6. The method of claim 1 , wherein the patterned mask layer is a patterned photoresist layer or a patterned hard mask layer.
7. The method of claim 1 , wherein etching using the patterned mask layer as the etching mask includes performing dry etching to etch the semiconductor substrate.
8. The method of claim 1 , wherein etching using the patterned mask layer as the etching mask includes performing wet etching to etch the semiconductor substrate.
9. A static random access memory cell, comprising:
a semiconductor substrate, wherein the semiconductor substrate includes at least one pull-down transistor region, at least one pull-up transistor region and at least one passing gate transistor region, the semiconductor substrate includes a plurality of isolation structures, the plurality of isolation structures define first active regions, second active regions and third active regions respectively in the at least one pull-down transistor region, the at least one pull-up transistor region and the at least one passing gate transistor region, and the first active regions include a plurality of first trenches, and the third active regions include a plurality of third trenches;
a gate oxide layer conformally covering the semiconductor substrate and conformally covering inner surfaces of the first trenches in the at least one pull-down transistor region and inner surfaces of the third trenches in the at least one passing gate transistor region; and
a conductive material layer, wherein the conductive material layer includes first gate structures located in the at least one pull-down transistor region, second gate structures located in the at least one pull-up transistor region and third gate structures located in the at least one passing gate transistor region, the conductive material layer is disposed on the gate oxide layer and fills up the first trenches in the at least one pull-down transistor region and the third trenches in the at least one passing gate transistor region, wherein the first gate structure has a first effective channel width, the second gate structure has a second effective channel width and the third gate structure has a third effective channel width, the first effective channel width is larger than the third effective channel width, and the third effective channel width is larger than the second effective channel width.
10. The SRAM cell of claim 9 , wherein a width of the first trenches is larger than a width of the third trenches.
11. The SRAM cell of claim 9 , wherein the second active regions in the at least one pull-up transistor region includes a plurality of the second trenches.
12. The SRAM cell of claim 11 , wherein the gate oxide layer conformally covers the semiconductor substrate and conformally covers inner surfaces of the plurality of second trenches in the at least one pull-up transistor region, and the conductive material layer covers the gate oxide layer and fills up the plurality of second trenches in the at least one pull-up transistor region.
13. The SRAM cell of claim 12 , wherein a width of the first trenches is larger than a width of the third trenches, a width of the third trenches is larger than a width of the second trenches.
14. The SRAM cell of claim 9 , wherein a material of the conductive material layer includes doped polysilicon or polycide.