Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures
Quantum-size-controlled photoelectrochemical (QSC-PEC) etching provides a new route to the precision fabrication of epitaxial semiconductor nanostructures in the sub-10-nm size regime. For example, quantum dots (QDs) can be QSC-PEC-etched from epitaxial InGaN thin films using narrowband laser photoexcitation, and the QD sizes (and hence bandgaps and photoluminescence wavelengths) are determined by the photoexcitation wavelength.
1. A method to fabricate semiconductor nanostructures, comprising:
providing a semiconductor in a photoelectrochemical cell;
illuminating a surface of the semiconductor with narrowband light having energy exceeding the bandgap energy of the semiconductor; and
photoelectrochemically etching the surface of the semiconductor until a nanostructure forms in the surface that has a quantum-size-dependent bandgap energy greater than the energy of the narrowband light.
2. The method of claim 1 , wherein the semiconductor comprises an III-V semiconductor.
3. The method of claim 2 , wherein the III-V semiconductor comprises (Ga, Al, In)—(P, As, Sb) alloy.
4. The method of claim 2 , wherein the III-V semiconductor comprises an III-nitride semiconductor.
5. The method of claim 4 , wherein the III-nitride semiconductor comprises InGaN.
6. The method of claim 1 , wherein the narrowband light has a bandwidth of less than 5 nm.
7. The method of claim 1 , wherein the semiconductor comprises an epitaxial semiconductor film deposited on a substrate having a wider bandgap energy than the bandgap energy of the epitaxial semiconductor film, whereby the photochemical etching occurs on the exposed top surface of the epitaxial semiconductor film.
8. The method of claim 1 , wherein the semiconductor comprises a quantum well layer sandwiched between two layers of material having wider bandgap energies than the epitaxial semiconductor film, whereby the photoelectrochemical etching occurs laterally inwards from the sides of the quantum well layer.
9. The method of claim 8 , wherein the thickness of quantum well layer is less than 10 nm.
10. The method of claim 1 , further comprising patterning the surface of the semiconductor to provide one or more etched mesas or nanowires prior to the step of photoelectrochemically etching the surface of the semiconductor.
11. The method of claim 1 , wherein the surface of the semiconductor comprises an array of top-down fabricated nanowires.
12. The method of claim 1 , wherein the surface of the semiconductor comprises an array of bottom-up grown nanowires.
13. The method of claim 1 , wherein the surface of the semiconductor comprises one or more epitaxially grown quantum dots.
14. The method of claim 1 , wherein the surface of the semiconductor comprises on or more colloidal quantum dots.
15. The method of claim 1 , wherein the nanostructure is formed at a predetermined location on the surface.
16. The method of claim 1 , wherein the electrolyte of the photoelectrochemical cell comprises a base.
17. The method of claim 16 , wherein the base comprises potassium hydroxide.
18. The method of claim 1 , wherein the electrolyte of the photoelectrochemical cell comprises an acid.
19. The method of claim 18 , wherein the acid comprises sulfuric acid.
20. The method of claim 1 , wherein the semiconductor is biased at a potential greater than 0.1 V during the photoelectrochemical etching.